Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment
Louis, E., Voorma, H.-J., Koster, N.B., Shmaenok, L., Bijkerk, F., Schlatmann, R., Verhoeven, J., Platonov, Yu.Ya, van Dorssen, G.E., Padmore, H.A.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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Journal Article
Multilayer coated reflective optics for Extreme UV lithography
Louis, E., Voorma, H.-J., Koster, N.B., Bijkerk, F., Platonov, Yu.Ya, Zuev, S.Yu, Andreev, S.S., Shamov, E.A., Salashchenko, N.N.
Published in Microelectronic engineering (01.02.1995)
Published in Microelectronic engineering (01.02.1995)
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Journal Article
Conference Proceeding
EXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature
Voorma, H.-J., van Dorssen, G.E., Louis, E., Koster, N.B., Smith, A.D., Roper, M.D., Bijkerk, F.
Published in Applied surface science (01.03.1996)
Published in Applied surface science (01.03.1996)
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Journal Article
Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks
Bijkerk, F., Shmaenok, L.A., Louis, E., Voorma, H.J., Koster, N.B., Bruineman, C., Bastiaensen, R.K.F.J., van der Drift, E.W.J.M., Romijn, J., de Groot, L.E.M., Rousseeuw, B.A.C., Zijlstra, T., Platonov, Yu.Ya, Salashchenko, N.N.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Journal Article
Conference Proceeding
Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub- 100 nanometer lithography processes
Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H.-J., van der Wiel, M.J., Schlatmann, R., Verhoeven, J., van der Drift, E.W.J.M., Romijn, J., Rousseeuw, B.A.C., Voβ, F., Desor, R., Nikolaus, B.
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
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Journal Article