Issues of laser plasma sources for soft x-ray projection lithography
Shmaenok, L., Bijkerk, F., Louis, E., van Honk, A., van der Wiel, M.J., Platonov, Yu, Shevelko, A., Mitrofanov, A., Frowein, H., Nicolaus, B., Voβ, F., Désor, R.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
Get full text
Journal Article
Optimization of a novel ETV system for solid sample introduction into an ICP and its application to the determination of trace impurities in SiC
Golloch, A., Haveresch-Kock, M., Plantikow-Voβgätter, F.
Published in Spectrochimica acta. Part B: Atomic spectroscopy (01.06.1995)
Published in Spectrochimica acta. Part B: Atomic spectroscopy (01.06.1995)
Get full text
Journal Article
Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub- 100 nanometer lithography processes
Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H.-J., van der Wiel, M.J., Schlatmann, R., Verhoeven, J., van der Drift, E.W.J.M., Romijn, J., Rousseeuw, B.A.C., Voβ, F., Desor, R., Nikolaus, B.
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
Get full text
Journal Article
Application of an ETV-ICP system for the determination of elements in human hair
Plantikow-Voβgätter, F., Denkhaus, E.
Published in Spectrochimica acta. Part B: Atomic spectroscopy (01.01.1996)
Published in Spectrochimica acta. Part B: Atomic spectroscopy (01.01.1996)
Get full text
Journal Article