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"Vishal, Vaibhaw"
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플로팅 웨이퍼 척
by
BALAN AVIV
,
VISHAL VAIBHAW
Year of Publication
23.12.2019
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고온 처리 응용에서 측정 파라미터를 획득하기 위한 계장화 기판 장치
by
SUN MEI
,
VISHAL VAIBHAW
Year of Publication
12.09.2018
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Role of Computed Tomography Guided Fine-Needle Aspiration Cytology in the Study of Various Thoracic Mass Lesions
by
Kumari, Nawanita
,
Kumar, Nidhish
,
Singh, Sharvani
,
Vaibhaw
,
Vishal
Published in
Journal of evolution of medical and dental sciences
(03.05.2021)
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HEAT SHIELD MODULE FOR SUBSTRATE-LIKE METROLOGY DEVICE
by
SUN MEI
,
VISHAL VAIBHAW
Year of Publication
12.03.2014
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COMPARATIVE STUDY OF DEXMEDETOMIDINE AND MAGNESIUM SULPHATE AS AN ADJUVANT TO BUPIVACAINE IN SPINAL ANESTHESIA
by
Singh, Rakesh Kumar
,
Vaibhaw
,
Vishal
,
Hasnat, Sabir
Published in
Journal of evidence based medicine and healthcare
(29.08.2015)
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METHODS OF ATTACHING A MODULE ON WAFER SUBSTRATE
by
HEARN KRIS
,
SUN MEI
,
VISHAL VAIBHAW
,
NGUYEN ANDREW
Year of Publication
01.10.2015
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PROCESS CONDITION MEASURING DEVICE (PCMD) AND METHOD FOR MEASURING PROCESS CONDITIONS IN A WORKPIECE PROCESSING TOOL CONFIGURED TO PROCESS PRODUCTION WORKPIECES
by
SUN MEI
,
ARLEO PAUL
,
JENSEN EARL
,
VISHAL VAIBHAW
,
QULI FARHAT
Year of Publication
10.01.2014
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Instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
by
Vishal
,
Vaibhaw
,
Sun, Mei
Year of Publication
19.10.2021
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INSTRUMENTED SUBSTRATE APPARATUS FOR ACQUIRING MEASUREMENT PARAMETERS IN HIGH TEMPERATURE PROCESS APPLICATIONS
by
VISHAL
,
Vaibhaw
,
SUN, Mei
Year of Publication
29.09.2020
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INSTRUMENTED SUBSTRATE APPARATUS FOR ACQUIRING MEASUREMENT PARAMETERS IN HIGH TEMPERATURE PROCESS APPLICATIONS
by
VISHAL
,
Vaibhaw
,
SUN, Mei
Year of Publication
30.03.2020
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FLOATING WAFER CHUCK
by
BALAN, Aviv
,
VISHAL
,
Vaibhaw
Year of Publication
15.11.2018
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Floating wafer chuck
by
Vishal
,
Vaibhaw
,
Balan, Aviv
Year of Publication
25.09.2018
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INSTRUMENTED SUBSTRATE APPARATUS FOR ACQUIRING MEASUREMENT PARAMETERS IN HIGH TEMPERATURE PROCESS APPLICATIONS
by
VISHAL
,
Vaibhaw
,
SUN, Mei
Year of Publication
30.08.2018
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INSTRUMENTED SUBSTRATE APPARATUS FOR ACQUIRING MEASUREMENT PARAMETERS IN HIGH TEMPERATURE PROCESS APPLICATIONS
by
VISHAL
,
Vaibhaw
,
SUN, Mei
Year of Publication
10.08.2017
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Instrumented Substrate Apparatus for Acquiring Measurement Parameters in High Temperature Process Applications
by
Sun Mei
,
Vishal Vaibhaw
Year of Publication
03.08.2017
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Instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
by
VISHAL
,
VAIBHAW
,
SUN, MEI
Year of Publication
01.07.2021
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HEAT SHIELD MODULE FOR SUBSTRATE-LIKE METROLOGY DEVICE
by
VISHAL
,
VAIBHAW
,
SUN, MEI
Year of Publication
12.08.2015
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PROCESS CONDITION MEASURING DEVICE (PCMD) AND METHOD FOR MEASURING PROCESS CONDITIONS IN A WORKPI ECE PROCESSING TOOL CONFIGURED TO PROCESS PRODUCTION WORKPIECES
by
JENSEN, Earl
,
ARLEO, Paul
,
QULI, Farhat
,
VISHAL
,
Vaibhaw
,
SUN, Mei
Year of Publication
04.03.2020
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FLOATING WAFER CHUCK
by
BALAN AVIV
,
VISHAL VAIBHAW
Year of Publication
24.12.2019
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Heat shield module for substrate-like metrology device
by
SUN MEI
,
VISHAL VAIBHAW
Year of Publication
25.03.2014
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