Variability in Si/SiGe and Si/SiO2 Spin Qubits due to Interfacial Disorder
Cvitkovich, L., Sklenard, B., Waldhor, D., Li, J., Wilhelmer, C., Veste, G., Niquet, Y.-M., Grasser, T.
Published in 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2023)
Published in 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2023)
Get full text
Conference Proceeding