Characterization of CMOS sub-65 nm metallic contact by laser scattering: Thermal stability of Ni(Si 1− x Ge x )
Arrazat, B., Danel, A., Nolot, E., Favier, S., Carron, V., Nemouchi, F., Hartmann, J.M., Rolland, G., Vandelle, P., Kermarrec, O., Campidelli, Y., Descombes, S.
Published in Microelectronic engineering (01.11.2007)
Published in Microelectronic engineering (01.11.2007)
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Journal Article
Conference Proceeding
Characterization of CMOS sub-65nm metallic contact by laser scattering: Thermal stability of Ni(Si1−xGex)
Arrazat, B., Danel, A., Nolot, E., Favier, S., Carron, V., Nemouchi, F., Hartmann, J.M., Rolland, G., Vandelle, P., Kermarrec, O., Campidelli, Y., Descombes, S.
Published in Microelectronic engineering (01.11.2007)
Published in Microelectronic engineering (01.11.2007)
Get full text
Journal Article