Progress in EUV Resist Performance
Goethals, A. M., Gronheid, R., Roey, F. Van, Solak, H. H., Ekinci, Y.
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
Status of EUV Lithography at IMEC
Goethal, A. M., Jockheere, R., Lurusso, C. F., Hermans, J., Roey, F. Van, Myers, A., Niroomand, A., Kim, I., Iwamoto, F., Stepenenko, N., Ronse, K.
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
EUV Resist Screening: Current Performance and Issues
Goethals, A. M., Gronheld, R., Leumissen, L. H. A., Roey, F. Van, Solak, H. H.
Published in Journal of Photopolymer Science and Technology (2005)
Published in Journal of Photopolymer Science and Technology (2005)
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Journal Article
Introducing 157 nm Full Field Lithography
Goethals, A.M., Bisschop, P. De, Hermans, J., Jonckheere, R., Roey, F. Van, Heuvel, D. Van den, Eliat, A., Ronse, K.
Published in Journal of Photopolymer Science and Technology (2003)
Published in Journal of Photopolymer Science and Technology (2003)
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Journal Article
Recent advancements in 193 nm step and scan lithography
Goethals, A.M., Jaenen, P., Pollers, I., Roey, F. van, Ronse, K., Heskamp, B., Davies, G.
Published in Journal of photopolymer science and technology (1999)
Published in Journal of photopolymer science and technology (1999)
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Journal Article
300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition
Clerix, J.J., Warad, L., Hung, J., Hody, H., Van Roey, F., Lorusso, G., Koret, R., Lee, W.T., Shah, K., Delabie, A.
Published in Applied surface science (30.07.2023)
Published in Applied surface science (30.07.2023)
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Journal Article
Lithographic performance of 193nm single and bi-layer materials
Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.
Published in Journal of Photopolymer Science and Technology (1998)
Published in Journal of Photopolymer Science and Technology (1998)
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Journal Article
Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology
Sugihara, T., Van Roey, F., Goethals, A.M., Ronse, K., Van den hove, L.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
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Journal Article
Conference Proceeding
Recent advancements in 193nm step and scan lithography
Goethals, A.M., Jaenen, P., Pollers, I., Roey, F. van, Ronse, K., Heskamp, B., Davies, G.
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Published in Journal of Photopolymer Science and Technology (30.05.1999)
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Journal Article
Characterization of extreme ultraviolet resists with interference lithography
Gronheid, Roel, Solak, Harun H., Ekinci, Yasin, Jouve, Amandine, Van Roey, Frieda
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Lithographic performance of 193 nm single and bi-layer materials
Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.
Published in Journal of photopolymer science and technology (1998)
Published in Journal of photopolymer science and technology (1998)
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Journal Article
Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, A., Demuynck, S., Ercken, M., Goethals, A.M., Locorotondo, S., Lazzarino, F., Altamirano, E., Huffman, C., De Keersgieter, A., Brus, S., Demand, M., Struyf, H., De Backer, J., Hermans, J., Delvaux, C., Baudemprez, B., Vandeweyer, T., Van Roey, F., Baerts, C., Goossens, D., Dekkers, H., Ong, P., Heylen, N., Kellens, K., Volders, H., Hikavyy, A., Vrancken, C., Rakowski, M., Verhaegen, S., Dusa, M., Romijn, L., Pigneret, C., Van Dijk, A., Schreutelkamp, R., Cockburn, A., Gravey, V., Meiling, H., Hultermans, B., Lok, S., Shah, K., Rajagopalan, R., Gelatos, J., Richard, O., Bender, H., Vandenberghe, G., Beyer, G.P., Absil, P., Hoffmann, T., Ronse, K., Biesemans, S.
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01.12.2009)
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01.12.2009)
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Conference Proceeding
EUV Resist Screening
M. Goethals, A, Gronheld, R, H. A. Leumissen, L, Van Roey, F, H. Solak, H
Published in Journal of photopolymer science and technology (01.09.2005)
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Published in Journal of photopolymer science and technology (01.09.2005)
Journal Article
Full-field EUV and immersion lithography integration in 0.186μm2 FinFET 6T-SRAM cell
Veloso, A., Demuynck, S., Ercken, M., Goethals, A.M., Demand, M., de Marneffe, J.-F., Altamirano, E., De Keersgieter, A., Delvaux, C., De Backer, J., Brus, S., Hermans, J., Baudemprez, B., Van Roey, F., Lorusso, G.F., Baerts, C., Goossens, D., Vrancken, C., Mertens, S., Versluijs, J.J., Truffert, V., Huffman, C., Laidler, D., Heylen, N., Ong, P., Parvais, B., Rakowski, M., Verhaegen, S., Hikavyy, A., Meiling, H., Hultermans, B., Romijn, L., Pigneret, C., Lok, S., Van Dijk, A., Shah, K., Noori, A., Gelatos, J., Arghavani, R., Schreutelkamp, R., Boelen, P., Richard, O., Bender, H., Witters, L., Collaert, N., Rooyackers, R., Absil, P., Lauwers, A., Jurczak, M., Hoffmann, T., Vanhaelemeersch, S., Cartuyvels, R., Ronse, K., Biesemans, S.
Published in 2008 IEEE International Electron Devices Meeting (01.12.2008)
Published in 2008 IEEE International Electron Devices Meeting (01.12.2008)
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Conference Proceeding