Design Considerations for Anti-reflection Layer in Thin Imaging System
Malik, Sanjay, De, Binod, Biafore, John, Spaziano, Greg, Sarubbi, Tom, Dilocker, Stephanie, Bowden, Murrae, Reybrouc, Mario, Grozev, Grozdan, Driessche, Veerle van, Tzviatkov, Plamen
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Recent Advances in Acetal-Based BUY Resists
Malik, Sanjay, Blakeney, Andrew J., Ferreira, Lawrence, Maxwell, Brian, Driessche, Veerle van, Whewell, Allyn, Sarubbi, Thomas R., Bowden, Murrae J., Fujimori, Toru, Tan, Shiro, Aoai, Toshiaki, Uenishi, Kazuya, Kawabe, Yasumasa, Kokubo, Tadayoshi
Published in Journal of Photopolymer Science and Technology (1999)
Published in Journal of Photopolymer Science and Technology (1999)
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Journal Article
DUV lithography for 0.35 μm CMOS processing
Van Driessche, Veerle, Goethals, Anne-Marie, de Beeck, Maaike Op, Ronse, Kurt, den hove, Luc Van
Published in Microelectronic engineering (01.02.1995)
Published in Microelectronic engineering (01.02.1995)
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