The threshold at which substrate nanogroove dimensions may influence fibroblast alignment and adhesion
Loesberg, W.A, te Riet, J, van Delft, F.C.M.J.M, Schön, P, Figdor, C.G, Speller, S, van Loon, J.J.W.A, Walboomers, X.F, Jansen, J.A
Published in Biomaterials (01.09.2007)
Published in Biomaterials (01.09.2007)
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Fluorescence Interference Contrast-enabled structures improve the microarrays performance
Dobroiu, S., van Delft, F.C.M.J.M., Aveyard-Hanson, J., Shetty, Prasad, Nicolau, D.V.
Published in Biosensors & bioelectronics (01.01.2019)
Published in Biosensors & bioelectronics (01.01.2019)
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Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography
van Dodewaard, A.J., Ketelaars, W.S.M.M., Roes, R.F.M., Kwinten, J.A.J., van Delft, F.C.M.J.M., van Run, A.J., van Langen-Suurling, A.K., Romijn, J.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Conference Proceeding
Manufacturing substrate nano-grooves for studying cell alignment and adhesion
van Delft, F.C.M.J.M., van den Heuvel, F.C., Loesberg, W.A., te Riet, J., Schön, P., Figdor, C.G., Speller, S., van Loon, J.J.W.A., Walboomers, X.F., Jansen, J.A.
Published in Microelectronic engineering (01.05.2008)
Published in Microelectronic engineering (01.05.2008)
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Conference Proceeding
Determination of nucleation and growth mechanisms
van Delft, F.C.M.J.M., van Langeveld, A.D., Nieuwenhuys, B.E.
Published in Thin solid films (01.01.1985)
Published in Thin solid films (01.01.1985)
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Journal Article
Nanoscale electrode gaps to study single molecule conduction
van Zalinge, H., van Delft, F.C.M.J.M., Weemaes, R.G.R., van Thiel, E.F.M.J., Snijder, J., Nicolau, D.V.
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
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Conference Proceeding
Image reversal revisited
van Delft, F.C.M.J.M., van der Kruis, F.J.H., Roosen, H.H.A.J., van de Laar, H.W.J.J.
Published in Microelectronic engineering (01.05.2008)
Published in Microelectronic engineering (01.05.2008)
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Conference Proceeding
Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies
Peuker, M., Lim, M.H., Smith, Henry I., Morton, R., van Langen-Suurling, A.K., Romijn, J., van der Drift, E.W.J.M., van Delft, F.C.M.J.M.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Silicon-containing copolymers of MMA tested for a positive-tone high-resolution bi-layer e-beam resist system
Maessen, J., van den Boogaart, S., Verstegen, E.J.K., Kloosterboer, J.G., van Delft, F.C.M.J.M., Catsburg, W., Habraken, F.H.P.M.
Published in Microelectronic engineering (01.03.2005)
Published in Microelectronic engineering (01.03.2005)
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Conference Proceeding
The composition of the (111) and (100) surfaces of a Pt0.25-Rh0.75 single crystal
SIERA, J, VAN DELFT, F. C. M. J. M, VAN LANGEVELD, A. D, NIEUWENHUYS, B. E
Published in Surface science (15.03.1992)
Published in Surface science (15.03.1992)
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The temperature dependence of the surface composition of Pt−Rh alloys
Van Delft, F.C.M.J.M., Van Langeveld, A.D., Nieuwenhuys, B.E.
Published in Surface science (01.10.1987)
Published in Surface science (01.10.1987)
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