Electrical and structural characterization of PLD grown CeO2-HfO2 laminated high-k gate dielectrics
KARAKAYA, K, BARCONES, B, RITTERSMA, Z. M, VAN BERKUM, J. G. M, VERHEIJEN, M. A, RIJNDERS, G, BLANK, D. H. A
Published in Materials science in semiconductor processing (01.12.2006)
Published in Materials science in semiconductor processing (01.12.2006)
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Quantitative depth profiling of SiOxNy layers on Si
van Berkum, J.G.M., Hopstaken, M.J.P., Snijders, J.H.M., Tamminga, Y., Cubaynes, F.N.
Published in Applied surface science (15.01.2003)
Published in Applied surface science (15.01.2003)
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Electrical and structural characterization of PLD grown CeO 2–HfO 2 laminated high- k gate dielectrics
Karakaya, K., Barcones, B., Rittersma, Z.M., van Berkum, J.G.M., Verheijen, M.A., Rijnders, G., Blank, D.H.A.
Published in Materials science in semiconductor processing (2006)
Published in Materials science in semiconductor processing (2006)
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Journal Article
Quantitative depth profiling of SiO xN y layers on Si
van Berkum, J.G.M., Hopstaken, M.J.P., Snijders, J.H.M., Tamminga, Y., Cubaynes, F.N.
Published in Applied surface science (2003)
Published in Applied surface science (2003)
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Selective versus non-selective growth of Si and SiGe
De Boer, W.B, Terpstra, D, Van Berkum, J.G.M
Published in Materials science & engineering. B, Solid-state materials for advanced technology (08.12.1999)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (08.12.1999)
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Low energy boron implantation in silicon and room temperature diffusion
Collart, E.J.H, Weemers, K, Cowern, N.E.B, Politiek, J, Bancken, P.H.L, van Berkum, J.G.M, Gravesteijn, D.J
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.04.1998)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.04.1998)
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Cluster ripening and transient enhanced diffusion in silicon
Cowern, N.E.B, Mannino, G, Stolk, P.A, Roozeboom, F, Huizing, H.G.A, van Berkum, J.G.M, Cristiano, F, Claverie, A, Jaraı́z, M
Published in Materials science in semiconductor processing (01.12.1999)
Published in Materials science in semiconductor processing (01.12.1999)
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Explorations for high performance SiGe-heterojunction bipolar transistor integration
Deixler, P., Huizing, H.G.A., Donkers, J.J.T.M., Klootwijk, J.H., Hartskeerl, D., de Boer, W.B., Havens, R.J., van der Toorn, R., Paasschens, J.C.J., Kloosterman, W.J., van Berkum, J.G.M., Terpstra, D., Slotboom, J.W.
Published in Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212) (2001)
Published in Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212) (2001)
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Characterization of Laminated CeO2-HfO2 High-k Gate Dielectrics Deposited by Pulsed Laser Deposition
Karakaya, Koray, Zinine, A., van Berkum, J.G.M., Graat, P., Verheijen, M.A., Rittersma, Z.M., Rijnders, A.J.H.M., Blank, D.H.A.
Published in Meeting abstracts (Electrochemical Society) (22.02.2006)
Published in Meeting abstracts (Electrochemical Society) (22.02.2006)
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Tantalum-based Gate Electrode Metals for Advanced CMOS Applications
Hooker, Jacob, Lander, Robert, Cubaynes, Florence, Schram, Tom, Roozeboom, F., van Zijl, Jeroen, Maas, Martien, van den Heuvel, Eric, Naburgh, Emile, van Berkum, J.G.M., Tamming, Y., Dao, Thuy, Henson, Kirklen, Schaekers, Marc, Ammel, Annemie Van, Tokei, Zsolt, Demand, Marc, Dachs, Charles
Published in Meeting abstracts (Electrochemical Society) (22.02.2006)
Published in Meeting abstracts (Electrochemical Society) (22.02.2006)
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Low VT Mo(O,N) metal gate electrodes on HfSiON for sub-45nm pMOSFET Devices
Singanamalla, R., Ravit, C., Vellianitis, G., Petry, J., Paraschiv, V., van Zijl, J.P., Brus, S., Verheijen, M., Weemaes, R.G.R., Kaiser, M., van Berkum, J.G.M., Hooker, J.C., Vos, R., Yu, H., de Meyer, K., Kubicek, S., Biesemans, S.
Published in 2006 International Electron Devices Meeting (01.12.2006)
Published in 2006 International Electron Devices Meeting (01.12.2006)
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Low-energy implantations of decaborane (B/sub 10/H/sub 14/) ion clusters in silicon wafers
Dirks, A.G., Bancken, P.H.L., Politiek, J., Cowern, N.E.B., Snijders, J.H.M., Van Berkum, J.G.M., Verheijen, M.A.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
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Optimization of Gate Oxide Recipes for 0.18 um CMOS Technology
van Brandenburg, A.C.M.C., Stolk, P.A., Montree, A.H., de Boer, W.B., van Berkum, J.G.M.
Published in 28th European Solid-State Device Research Conference (1998)
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Published in 28th European Solid-State Device Research Conference (1998)
Conference Proceeding
Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry
Collart, E.J.H., Heijdra, M., Weemers, K., Tamminga, Y., van Berkum, J.G.M., Verheijen, M.A.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
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A manufacturable 25 nm planar MOSFET technology
Ponomarev, Y.V., Loo, J.J.G.P., Dachs, C.J.J., Cubaynes, F.N., Verheijen, M.A., Kaiser, M., Van Berkum, J.G.M., Kubicek, S., Bolk, J., Rovers, M.
Published in 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184) (2001)
Published in 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184) (2001)
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Characterisation of low energy boron implants and electrical results of submicron PMOS transistors
Collart, E.J.H., Murrell, A.J., De Cock, G., Foad, M.A., Schmitz, J., van Zijl, J.P., van Berkum, J.G.M.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
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