Trap‐Limited Vacancy Diffusion in Silicon at High Temperatures
Voronkov, Vladimir V.
Published in Physica status solidi. A, Applications and materials science (01.10.2019)
Published in Physica status solidi. A, Applications and materials science (01.10.2019)
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Journal Article
Impact of hydrogen on the boron-oxygen-related lifetime degradation and regeneration kinetics in crystalline silicon
Helmich, Lailah, Walter, Dominic C., Falster, Robert, Voronkov, Vladimir V., Schmidt, Jan
Published in Solar energy materials and solar cells (01.10.2021)
Published in Solar energy materials and solar cells (01.10.2021)
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Journal Article
Fast and Slow Stages of Lifetime Degradation by Boron–Oxygen Centers in Crystalline Silicon
Schmidt, Jan, Bothe, Karsten, Voronkov, Vladimir V., Falster, Robert
Published in physica status solidi (b) (01.01.2020)
Published in physica status solidi (b) (01.01.2020)
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Journal Article
Minority carrier lifetime in indium doped silicon for photovoltaics
Murphy, John D., Pointon, Alex I., Grant, Nicholas E., Shah, Vishal A., Myronov, Maksym, Voronkov, Vladimir V., Falster, Robert J.
Published in Progress in photovoltaics (01.10.2019)
Published in Progress in photovoltaics (01.10.2019)
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Journal Article
APPARATUS FOR STRESSING SEMICONDUCTOR SUBSTRATES
VLADIMIR V VORONKOV, JOHN A PITNEY, ROBERT J FALSTER, ALBRECHT PETER D
Year of Publication 01.04.2021
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Year of Publication 01.04.2021
Patent
APPARATUS FOR STRESSING SEMICONDUCTOR SUBSTRATES
VLADIMIR V VORONKOV, JOHN A PITNEY, ROBERT J FALSTER, ALBRECHT PETER D
Year of Publication 18.03.2021
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Year of Publication 18.03.2021
Patent
EQUIPMENT FOR APPLYING STRESS TO SEMICONDUCTOR SUBSTRATE
VLADIMIR V VORONKOV, JOHN A PITNEY, ROBERT J FALSTER, ALBRECHT PETER D
Year of Publication 26.09.2019
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Year of Publication 26.09.2019
Patent
PROCESS AND APPARATUS FOR PREPARING STRAIN-REDUCED HETERO-STRUCTURE BY EXPANSION IN RADIAL DIRECTION
VLADIMIR V VORONKOV, JOHN A PITNEY, ROBERT J FALSTER, ALBRECHT PETER D
Year of Publication 16.08.2018
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Year of Publication 16.08.2018
Patent
DEVICE FOR APPLYING STRESS TO SEMICONDUCTOR SUBSTRATE
VLADIMIR V VORONKOV, JOHN A PITNEY, ROBERT J FALSTER, ALBRECHT PETER D
Year of Publication 26.07.2018
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Year of Publication 26.07.2018
Patent