Chemical and electrochemical interaction of acidic H2O2 solutions with (100) InP
THEUWIS, A, VERMEIR, I. E, GOMES, W. P
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (27.06.1996)
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (27.06.1996)
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Fundamental study on the selective etching of Al0.25Ga0.75As versus GaAs in acidic iodine solutions
VERPOORT, P. J, VERMEIR, I. E, GOMES, W. P
Published in Journal of the Electrochemical Society (01.10.1995)
Published in Journal of the Electrochemical Society (01.10.1995)
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Journal Article
Some fundamental aspects of profile etching at InP surfaces
VERMEIR, I. E, GOMES, W. P, VAN DAELE, P
Published in Journal of the Electrochemical Society (01.09.1995)
Published in Journal of the Electrochemical Society (01.09.1995)
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On the etching of InP in alkaline K3Fe(CN)6 solutions
VERMEIR, I. E, GOMES, W. P
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (21.02.1994)
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (21.02.1994)
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Electrochemical and etching behavior of InP single crystals in iodic acid solutions
VERMEIR, I. E, GOOSSENS, H. H, VANDEN KERCHOVE, F, GOMES, W. P
Published in Journal of the Electrochemical Society (01.05.1992)
Published in Journal of the Electrochemical Society (01.05.1992)
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Electrochemical etching of n-type silicon in fluoride solutions
HOFFMANN, P. M, VERMEIR, I. E, SEARSON, P. C
Published in Journal of the Electrochemical Society (01.08.2000)
Published in Journal of the Electrochemical Society (01.08.2000)
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