Wafer Scale Processing of Plasmonic Nanoslit Arrays in 200mm CMOS Fab Environment
Malachowski, Karl, Verbeeck, Rita, Dupont, Tania, Chen, Chang, Li, Yi, Musa, Silke, Stakenborg, Tim, Sabuncuoglu Tezcan, Deniz, Van Dorpe, Pol
Published in ECS transactions (15.03.2013)
Published in ECS transactions (15.03.2013)
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Journal Article
Dose Enhancement Due to Interconnects in Deep-Submicron MOSFETs Exposed to X-Rays
Griffoni, A., Silvestri, M., Gerardin, S., Meneghesso, G., Paccagnella, A., Kaczer, B., de Potter de ten Broeck, M., Verbeeck, R., Nackaerts, A.
Published in IEEE transactions on nuclear science (01.08.2009)
Published in IEEE transactions on nuclear science (01.08.2009)
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Journal Article
Morphology of corrosion pits in aluminum thin film metallizations
Proost, Joris, Baklanov, Michael, Verbeeck, Rita, Maex, Karen
Published in Journal of solid state electrochemistry (01.05.1998)
Published in Journal of solid state electrochemistry (01.05.1998)
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Journal Article
Etching of CoSi 2 in HF-based solutions
Donaton, Ricardo A., Lokere, Kristiaan, Verbeeck, Rita, Maex, Karen
Published in Applied surface science (1995)
Published in Applied surface science (1995)
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Journal Article
On the formation of silicides on poly runners with topography by a two-step silicidation process
Jonckx, Franky, Verbeeck, Rita, Deweerdt, Bruno, Maex, Karen
Published in Applied surface science (02.10.1995)
Published in Applied surface science (02.10.1995)
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Journal Article
Conference Proceeding
Wafer Scale Processing of Plasmonic Nanopore Arrays in 200mm CMOS Fab Environment
Malachowski, Karl, Verbeeck, Rita, Dupont, Tania, Chen, Chang, Musa, Silke, Li, Yi, Stakenborg, Tim, Sabuncuoglu, Deniz, Van Dorpe, Pol
Published in Meeting abstracts (Electrochemical Society) (04.06.2012)
Published in Meeting abstracts (Electrochemical Society) (04.06.2012)
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Journal Article
Materials Issues of Ni Fully Silicided (FUSI) Gates for CMOS Applications
Kittl, Jorge, Lauwers, Anne, van Dal, Mark, Demeurisse, Caroline, Anil, K, Veloso, Anabela, Pawlak, Malgorzata, Cunniffe, J, Schram, Tom, Verbeeck, Rita, Christa, Vrancken, Kubicek, Stefan, Maex, Karen
Published in Meeting abstracts (Electrochemical Society) (22.02.2006)
Published in Meeting abstracts (Electrochemical Society) (22.02.2006)
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Journal Article
Dose enhancement due to interconnects in deep-submicron MOSFETs exposed to X-rays
Griffoni, A, Silvestri, M, Gerardin, S, Meneghesso, G, Paccagnella, A, Kaczer, B, de Potter de ten Broeck, M, Verbeeck, R, Nackaerts, A
Published in 2008 European Conference on Radiation and Its Effects on Components and Systems (01.09.2008)
Published in 2008 European Conference on Radiation and Its Effects on Components and Systems (01.09.2008)
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Conference Proceeding
Process for self-aligned implantation
JANSEN, PHILIPPE, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, DONATON RICARDO ALVES, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 03.01.2007
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Year of Publication 03.01.2007
Patent
Ätzverfahren für CoSi2-Schichten und Verfahren zur Herstellung von Schottky-Barrieren Detektoren unter Verwendung desselben
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 23.10.2003
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Year of Publication 23.10.2003
Patent
ÄTZVERFAHREN FÜR COSI2-SCHICHTEN UND VERFAHREN ZUR HERSTELLUNG VON SCHOTTKY-BARRIEREN DETEKTOREN UNTER VERWENDUNG DESSELBEN
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 15.02.2003
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Year of Publication 15.02.2003
Patent
Etching process of CoSi2 layers and process for the fabrication of Schottky-barrier detectors using the same
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 15.01.2003
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Year of Publication 15.01.2003
Patent
Etching process of CoSi2 layers
JANSEN PHILIPPE, MAEX KAREN IRMA JOSEF, DONATON RICARDO ALVES, VERBEECK RITA, BAKLANOV MIKHAIL RODIONOVICH, ROOYACKERS RITA, DEFERM LUDO
Year of Publication 03.07.2001
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Year of Publication 03.07.2001
Patent
Etching process of CoSi2 layers
VERBEECK; RITA, ROOYACKERS; RITA, DEFERM; LUDO, BAKLANOV; MIKHAIL RODIONOVICH, MAEX; KAREN IRMA JOSEF, DONATON; RICARDO ALVES, JANSEN; PHILIPPE
Year of Publication 28.11.2000
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Year of Publication 28.11.2000
Patent
Process for self-aligned implantation
JANSEN, PHILIPPE, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, DONATON RICARDO ALVES, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 02.02.2000
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Year of Publication 02.02.2000
Patent
Process for self-aligned implantation
JANSEN, PHILIPPE, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, DONATON RICARDO ALVES, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 16.06.1999
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Year of Publication 16.06.1999
Patent
Etching process of CoSi2 layers
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 16.04.1997
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Year of Publication 16.04.1997
Patent