Search Results - "VENKATARAMAN, Shyam Sundar" :: K.UTB vyhledávací portál

전기촉매 적용례를 위한 금속-도핑된 주석 산화물

by PENG XU YUAN, VENKATARAMAN SHYAM SUNDAR, RINCON OVALLES ROSALBA ADRIANA, HAAS ANDREAS, BAYER DOMNIK
Year of Publication 21.11.2018

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A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYLIC ACID

by VENKATARAMAN SHYAM SUNDAR, LI YUZHUO, ZHONG MINGJIE
Year of Publication 23.10.2014

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PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS

by VENKATARAMAN SHYAM SUNDAR, PINDER HARVEY WAYNE, LI YUZHUO
Year of Publication 23.12.2013

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METHOD FOR MANUFACTURING CMP COMPOSITION AND APPLICATION THEREOF

by VENKATARAMAN SHYAM SUNDAR, SU EASON YU SHEN
Year of Publication 04.09.2014

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AQUEOUS, NITROGEN-FREE CLEANING COMPOSITION, PREPARATION AND USE THEREOF

by VENKATARAMAN SHYAM SUNDAR, MELLIES RAIMUND, KLIPP ANDREAS, RAMAN VIJAY IMMANUEL, ZHONG MINGJIE
Year of Publication 23.01.2014

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AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES

by VENKATARAMAN SHYAM SUNDAR, CHU JEA JU, USMAN IBRAHIM SHEIK ANSAR, PINDER HARVEY WAYNE, LI YUZHUO
Year of Publication 06.12.2013

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AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS

by VENKATARAMAN SHYAM SUNDAR, USMAN IBRAHIM SHEIK ANSAR, PINDER HARVEY WAYNE, LI YUZHUO, FRANZ DIANA, NOLLER BASTIAN
Year of Publication 06.12.2013

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AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES

by VENKATARAMAN SHYAM SUNDAR, CHU JEA JU, USMAN IBRAHIM SHEIK ANSAR, PINDER HARVEY WAYNE, LI YUZHUO
Year of Publication 06.12.2013

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AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS

by VENKATARAMAN SHYAM SUNDAR, KINGMA AREND JOUKE, SU EASON YU SHEN, NOLLER BASTIAN MARTEN
Year of Publication 22.11.2013

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A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING INORGANIC PARTICLES AND POLYMER PARTICLES

by VENKATARAMAN SHYAM SUNDAR, SHEN DANIEL KWO HUNG, LI YUZHUO, RAMAN VIJAY IMMANUEL, LAUTER MICHAEL
Year of Publication 12.09.2012

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AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS

by VENKATARAMAN SHYAM SUNDAR, CHU JEA JU, PINDER HARVEY WAYNE, LI YUZHUO, CHIU WEI LAN WILLIAM
Year of Publication 17.09.2013

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CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING POLYVINYL PHOSPHONIC ACID AND ITS DERIVATIVES

by VENKATARAMAN SHYAM SUNDAR, SU EASON YU SHEN, SCHADE CHRISTIAN, USMAN IBRAHIM SHEIK ANSAR, LI YUZHUO, RAMAN VIJAY IMMANUEL
Year of Publication 04.09.2014

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A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND

by Li, Yuzhuo, Zhong, Mingije, Venkataraman, Shyam Sundar
Year of Publication 16.03.2022

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METAL-DOPED TIN OXIDE FOR ELECTROCATALYSIS APPLICATIONS

by HAAS, ANDREAS, PENG, XU YUAN, VENKATARAMAN, SHYAM SUNDAR, BAYER, DOMNIK, RINCON-OVALLES, ROSALBA ADRIANA
Year of Publication 27.02.2024

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A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYLIC ACID

by Li, Yuzhuo, Zhong, Mingije, Venkataraman, Shyam Sundar
Year of Publication 10.10.2018

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METALDOTERET TINOXID TIL ANVENDELSER INDEN FOR ELEKTROKATALYSE

by VENKATARAMAN, Shyam Sundar, BAYER, Domnik, PENG, Xu Yuan, Rincon-Ovalles, Rosalba Adriana, HAAS, Andreas
Year of Publication 07.03.2022

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METAL-DOPED TIN OXIDE FOR ELECTROCATALYSIS APPLICATIONS

by VENKATARAMAN, Shyam Sundar, RINCON-OVALLES, Rosalba Adriana, BAYER, Domnik, PENG, Xu Yuan, HAAS, Andreas
Year of Publication 15.12.2021

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Metal-doped tin oxide for electrocatalysis applications

by Bayer, Domnik, Peng, Xu Yuan, Haas, Andreas, Venkataraman, Shyam Sundar, Ricon-Ovalles, Rosalba Adriana
Year of Publication 07.09.2021

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A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANINGB COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYCLIC ACID

by LI, Yuzhuo, VENKATARAMAN, SHYAM SUNDAR, ZHONG, MINGJIE
Year of Publication 28.09.2019

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A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL

by ZHONG, Mingjie, VENKATARAMAN, Shyam Sundar, LI, Yuzhuo
Year of Publication 07.08.2019

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