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Year of Publication 31.03.2023
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Year of Publication 03.04.2023
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Year of Publication 21.09.2023
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Year of Publication 21.09.2023
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IMPURITY REDUCTION IN SILICON-CONTAINING FILMS
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Year of Publication 05.10.2023
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Year of Publication 05.10.2023
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Year of Publication 31.08.2023
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Year of Publication 31.08.2023
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Year of Publication 24.08.2023
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Year of Publication 24.08.2023
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Year of Publication 03.08.2023
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IMPURITY REDUCTION IN SILICON-CONTAINING FILMS
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Year of Publication 03.02.2022
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Year of Publication 03.02.2022
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CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPOSITION RATE
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Year of Publication 27.01.2022
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Year of Publication 27.01.2022
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Seam-free and crack-free deposition
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Year of Publication 16.01.2024
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Year of Publication 16.01.2024
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Thermal film deposition
VAN SCHRAVENDIJK, BART J, GUPTA, AWNISH, AGARWAL, PULKIT, RAMASAGARAM, PRANEETH, LIU, PEII, VARNELL, JASON ALEXANDER, PETRAGLIA, JENNIFER LEIGH, AUSTIN, DUSTIN ZACHARY, AGNEW, DOUGLAS WALTER
Year of Publication 16.12.2023
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Year of Publication 16.12.2023
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High pressure inert oxidation and in-situ annealing process to improve film seam quality and WER
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Year of Publication 01.12.2023
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Year of Publication 01.12.2023
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Impurity reduction in silicon-containing films
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Year of Publication 16.06.2022
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Conformal thermal CVD with controlled film properties and high deposition rate
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Year of Publication 01.05.2022
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Year of Publication 01.05.2022
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