Enabling backside processing for perforated microfluidic devices
Visker, Jakob, Han, Yang, Visker, Evert, Thuy, Chi Dang Thi, Gocyla, Mateusz, Humbert, Aurelie, Ackaert, Jan, Peng, Lan, Vanhaelemeersch, Serge
Published in 2023 IEEE 73rd Electronic Components and Technology Conference (ECTC) (01.05.2023)
Published in 2023 IEEE 73rd Electronic Components and Technology Conference (ECTC) (01.05.2023)
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Conference Proceeding
A novel integration scheme for wafer singulation and selective processing using temporary dry film resist
La Grappe, Alexandre, Visker, Evert, Redolfi, Augusto, Peng, Lan, Muga, Karthik, Huls, David, Vanhaelemeersch, Serge, Lauwers, Anne, Ackaert, Jan
Published in 2021 IEEE 71st Electronic Components and Technology Conference (ECTC) (01.06.2021)
Published in 2021 IEEE 71st Electronic Components and Technology Conference (ECTC) (01.06.2021)
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Conference Proceeding
A PROCESS FOR WAFER BONDING
VISKER, Jakob, VANHAELEMEERSCH, Serge, PENG, Lan, DANG THI THUY, Chi, HUMBERT, Aurelie, VISKER, Evert
Year of Publication 10.04.2024
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Year of Publication 10.04.2024
Patent
Process for Wafer Bonding
Humbert, Aurelie, Dang Thi Thuy, Chi, Peng, Lan, Vanhaelemeersch, Serge, Visker, Evert, Visker, Jakob
Year of Publication 04.04.2024
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Year of Publication 04.04.2024
Patent
The etchback approach: Enlarged process window for MuGFET gate etching
Degroote, Bart, Collaert, Nadine, Rooyackers, Rita, Baklanov, Mikhail R., Boullart, Werner, Kunnen, Eddy, Jurczak, Malgorzata, Vanhaelemeersch, Serge
Published in Microelectronic engineering (01.03.2006)
Published in Microelectronic engineering (01.03.2006)
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Journal Article
Wet Etch Characteristics of Hafnium Silicate Layers
Claes, Martine, Paraschiv, Vasile, Dictus, Dries, Conard, Thierry, Boullart, Werner, Vanhaelemeersch, Serge, De Gendt, Stefan, Delabie, Annelies, Van Elshocht, Sven, Zhao, Chao, Everaert, Jean-Luc
Published in ECS transactions (07.07.2006)
Published in ECS transactions (07.07.2006)
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Journal Article
Mass Metrology for controlling and understanding processes
Kunnen, E., Vecchio, G., Redolfi, A., Everaert, J.-L., Delabie, A., Xiaoping Shi, Vanhaelemeersch, S., Cunnane, L., Kiermansz, A.
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
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Conference Proceeding
Alternative dual damascene patterning approach
VAN HOVE, MARLEEN, STRUYF, HERBERT, VAN OLMEN, JAN, HENDRICKX, DIRK, BOULLART, WERNER, VANHAELEMEERSCH, SERGE
Year of Publication 31.08.2016
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Year of Publication 31.08.2016
Patent