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One Step Toward a New Generation of C‑MOS Compatible Oxide P–N Junctions: Structure of the LSMO/ZnO Interface Elucidated by an Experimental and Theoretical Synergic Work
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METHOD FOR MEASURING AT LEAST ONE TARGET ON A SUBSTRATE
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Substrate comprising a target arrangement, associated patterning device and metrology method
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SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD
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Year of Publication 28.06.2023
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Method of determining a value of a parameter of interest of a patterning process, device manufacturing method
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Year of Publication 23.11.2021
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METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD
MACHT, Lukasz Jerzy, BOS, Hilko Dirk, KUNNEMAN, Lucas Tijn, SMILDE, Hendrik Jan Hidde, VAN DEN BOS, Karel Hendrik Wouter, WARNAAR, Patrick, HAJIAHMADI, Mohammadreza, SOKOLOV, Sergei
Year of Publication 30.04.2020
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Year of Publication 30.04.2020
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A substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
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Year of Publication 16.10.2023
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Year of Publication 16.10.2023
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METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD
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Year of Publication 21.11.2022
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Year of Publication 21.11.2022
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Method of determining a value of a parameter of interest of a patterning process, device manufacturing method
WARNAAR, PATRICK, SMILDE, HENDRIK JAN HIDDE, HAJIAHMADI, MOHAMMADREZA, MACHT, LUKASZ JERZY, SOKOLOV, SERGEI, VAN DEN BOS, KAREL HENDRIK WOUTER, KUNNEMAN, LUCAS TIJN, BOS, HILKO DIRK
Year of Publication 01.07.2020
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Year of Publication 01.07.2020
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