Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2
Martin, Dominik, Yurchuk, Ekaterina, Müller, Stefan, Müller, Johannes, Paul, Jan, Sundquist, Jonas, Slesazeck, Stefan, Schlösser, Till, van Bentum, Ralf, Trentzsch, Martin, Schröder, Uwe, Mikolajick, Thomas
Published in Solid-state electronics (01.10.2013)
Published in Solid-state electronics (01.10.2013)
Get full text
Journal Article
Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors
Mulaosmanovic, Halid, Ocker, Johannes, Müller, Stefan, Schroeder, Uwe, Müller, Johannes, Polakowski, Patrick, Flachowsky, Stefan, van Bentum, Ralf, Mikolajick, Thomas, Slesazeck, Stefan
Published in ACS applied materials & interfaces (01.02.2017)
Published in ACS applied materials & interfaces (01.02.2017)
Get full text
Journal Article
Impact of Scaling on the Performance of HfO2-Based Ferroelectric Field Effect Transistors
Yurchuk, Ekaterina, Muller, Johannes, Paul, Jan, Schlosser, Till, Martin, Dominik, Hoffmann, Raik, Mueller, Stefan, Slesazeck, Stefan, Schroeder, Uwe, Boschke, Roman, van Bentum, Ralf, Mikolajick, Thomas
Published in IEEE transactions on electron devices (01.11.2014)
Published in IEEE transactions on electron devices (01.11.2014)
Get full text
Journal Article
Doped Hafnium Oxide – An Enabler for Ferroelectric Field Effect Transistors
Müller, Stefan, Polakowski, Patrick, Schenk, Tony, van Bentum, Ralf, Yurchuk, Ekaterina, Müller, Johannes, Slesazeck, Stefan, Mikolajick, Thomas, Schroeder, Uwe, Flachowsky, Stefan, Kolodinski, Sabine
Published in Advances in Science and Technology (31.10.2014)
Published in Advances in Science and Technology (31.10.2014)
Get full text
Journal Article
Origin of the endurance degradation in the novel HfO2-based 1T ferroelectric non-volatile memories
Yurchuk, Ekaterina, Mueller, Stefan, Martin, Dominik, Slesazeck, Stefan, Schroeder, Uwe, Mikolajick, Thomas, Muller, Johannes, Paul, Jan, Hoffmann, Raik, Sundqvist, Jonas, Schlosser, Till, Boschke, Roman, van Bentum, Ralf, Trentzsch, Martin
Published in 2014 IEEE International Reliability Physics Symposium (01.06.2014)
Published in 2014 IEEE International Reliability Physics Symposium (01.06.2014)
Get full text
Conference Proceeding
Charge-Trapping Phenomena in HfO sub(2)-Based FeFET-Type Nonvolatile Memories
Yurchuk, Ekaterina, Muller, Johannes, Muller, Stefan, Paul, Jan, Pesic, Milan, van Bentum, Ralf, Schroeder, Uwe, Mikolajick, Thomas
Published in IEEE transactions on electron devices (01.09.2016)
Published in IEEE transactions on electron devices (01.09.2016)
Get full text
Journal Article
Impact of Scaling on the Performance of HfO sub(2)-Based Ferroelectric Field Effect Transistors
Yurchuk, Ekaterina, Muller, Johannes, Paul, Jan, Schlosser, Till, Martin, Dominik, Hoffmann, Raik, Mueller, Stefan, Slesazeck, Stefan, Schroeder, Uwe, Boschke, Roman, van Bentum, Ralf, Mikolajick, Thomas
Published in IEEE transactions on electron devices (01.11.2014)
Published in IEEE transactions on electron devices (01.11.2014)
Get full text
Journal Article
Impact of Scaling on the Performance of HfO 2 -Based Ferroelectric Field Effect Transistors
Yurchuk, Ekaterina, Muller, Johannes, Paul, Jan, Schlosser, Till, Martin, Dominik, Hoffmann, Raik, Mueller, Stefan, Slesazeck, Stefan, Schroeder, Uwe, Boschke, Roman, van Bentum, Ralf, Mikolajick, Thomas
Published in IEEE transactions on electron devices (01.11.2014)
Published in IEEE transactions on electron devices (01.11.2014)
Get full text
Journal Article
Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2: Selected extended papers from ULIS 2012 conference
MARTIN, Dominik, YURCHUK, Ekaterina, SCHRÖDER, Uwe, MIKOLAJICK, Thomas, MÜLLER, Stefan, MÜLLER, Johannes, PAUL, Jan, SUNDQUIST, Jonas, SLESAZECK, Stefan, SCHLÖSSER, Till, VAN BENTUM, Ralf, TRENTZSCH, Martin
Published in Solid-state electronics (2013)
Get full text
Published in Solid-state electronics (2013)
Journal Article
SRAM read current variability and its dependence on transistor statistics
Venugopalan, Sriramkumar, Joshi, Vivek, Zamudio, Luis, Goldbach, Matthias, Burbach, Gert, Van Bentum, Ralf, Balasubramanian, Sriram
Published in Proceedings of the IEEE 2013 Custom Integrated Circuits Conference (01.09.2013)
Published in Proceedings of the IEEE 2013 Custom Integrated Circuits Conference (01.09.2013)
Get full text
Conference Proceeding
(Invited) Hafnium Oxide Based CMOS Compatible Ferroelectric Materials
Schroeder, Uwe, Martin, Dominik, Mueller, Johannes, Yurchuk, Ekatarina, Mueller, Stefan, Adelmann, Christoph, Schloesser, Till, van Bentum, Ralf, Mikolajick, Thomas
Published in ECS transactions (15.03.2013)
Published in ECS transactions (15.03.2013)
Get full text
Journal Article