Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications
Liberman, V, Rothschild, M, Sedlacek, J H, Uttaro, R S, Grenville, A, Bates, A K, Van Peski, C
Published in Optics letters (01.01.1999)
Published in Optics letters (01.01.1999)
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