In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors
Nye, Rachel A, Wang, Siyao, Uhlenbrock, Stefan, Smythe, 3rd, John A, Parsons, Gregory N
Published in Dalton transactions : an international journal of inorganic chemistry (01.02.2022)
Published in Dalton transactions : an international journal of inorganic chemistry (01.02.2022)
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Journal Article
Direct Emissions Reduction in Plasma Dry Etching Using Alternate Chemistries: Opportunities, Challenges and Need for Collaboration
Lugani, Gurpreet S., Skaggs, Robert, Morris, Bryan, Tolman, Tyler, Tervo, Douglas, Uhlenbrock, Stefan, Hacker, Jon, Tan, Chye Seng, Nehlsen, James P., Ridgeway, Robert G., Broadway, Lois Wong, Rudy, Francis P.
Published in IEEE transactions on semiconductor manufacturing (14.08.2024)
Published in IEEE transactions on semiconductor manufacturing (14.08.2024)
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Journal Article
analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors
Nye, Rachel A, Wang, Siyao, Uhlenbrock, Stefan, Smythe, John A, Parsons, Gregory N
Published in Dalton transactions : an international journal of inorganic chemistry (01.02.2022)
Published in Dalton transactions : an international journal of inorganic chemistry (01.02.2022)
Get full text
Journal Article
Methods of forming silicon nitride including plasma exposure
Pandey, Sumeet C, Uhlenbrock, Stefan, Smythe, John A, Quick, Timothy A, Kraus, Brenda D
Year of Publication 16.05.2023
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Year of Publication 16.05.2023
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