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Published in Optics express (30.04.2018)
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Advanced mask aligner lithography: new illumination system
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Published in Optics express (27.09.2010)
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Advanced mask aligner lithography (AMALITH) for thick photoresist
Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Hennemeyer, Marc, Zoberbier, Ralph, Voigt, Anja, Grützner, Gabi, Ünal, Nezih, Hofmann, Ulrich
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Published in Microsystem technologies (01.10.2014)
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METHOD AND DEVICE FOR MEASURING DISTANCE USING A DIFFRACTIVE STRUCTURE
VOGLER, Uwe, HARZENDORF, Torsten, ZEITNER, Uwe D, STÜRZEBECHER, Lorenz, VÖLKEL, Reinhard
Year of Publication 31.07.2019
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Year of Publication 31.07.2019
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Lightfields behind amplitude masks: Creating phase discontinuities
Scharf, Toralf, Puthankovilakam, Krishnaparvathy, Myun-Sik Kim, Herzig, Hans Peter, Vogler, Uwe, Noell, Wilfried, Bramati, Arianna, Volkel, Reinhard
Published in 2016 15th Workshop on Information Optics (WIO) (01.07.2016)
Published in 2016 15th Workshop on Information Optics (WIO) (01.07.2016)
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Press mold copying device, holding device for producing copying device and press mold method
JALALI GHAZALEH, VOGLER UWE, MAY CHRISTIAN, FINK GEORG, PAWLITZEK FABIAN
Year of Publication 10.11.2020
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Year of Publication 10.11.2020
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Lightfields behind amplitude and phase masks applications in high resolution proximity lithography
Scharf, Toralf, Puthankovilakam, Krishnaparvathy, Bernasconi, Johana, Myun-Sik Kim, Herzig, Hans Peter, Vogler, Uwe, Bramati, Arianna, Volkel, Reinhard
Published in 2015 14th Workshop on Information Optics (WIO) (01.06.2015)
Published in 2015 14th Workshop on Information Optics (WIO) (01.06.2015)
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Conference Proceeding