A Noble Design Methodology to Minimize Plasma Induced Damage Using a Distributed Network Model in VNAND Flash Memory
Lee, Se Hoon, Um, Junghwan, Kim, Kanglib, Lee, Kyoungseo, Chang, Seongpil, Lee, Jaeshin, Han, Hunhee, Cho, Sungil, Lim, Junhee, Park, Minchul, Hur, Sunghoi
Published in 2023 International Electron Devices Meeting (IEDM) (09.12.2023)
Published in 2023 International Electron Devices Meeting (IEDM) (09.12.2023)
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Conference Proceeding
Ring assembly and chuck assembly having the same
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Year of Publication 02.06.2020
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Year of Publication 02.06.2020
Patent
System for fabricating a semiconductor device
Park, Chanhoon, Choi, Il Sup, Um, JungHwan, Park, Jinyoung, Park, Hoyong, Jeon, Sangjean, Han, Je-Woo, Bang, Jin Young
Year of Publication 12.01.2021
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Year of Publication 12.01.2021
Patent
SYSTEM FOR FABRICATING A SEMICONDUCTOR DEVICE
PARK, Hoyong, PARK, CHANHOON, UM, JungHwan, BANG, JIN YOUNG, PARK, Jinyoung, CHOI, IL SUP, HAN, Je-Woo, JEON, SANGJEAN
Year of Publication 19.09.2019
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Year of Publication 19.09.2019
Patent
method for manufacturing semiconductor device and manufacturing apparatus of the same
PARK HOYONG, PARK JINYOUNG, PARK CHANHOON, UM JUNGHWAN, JEON SANGJEAN, BANG JIN YOUNG, CHOI IL SUP, HAN JE WOO
Year of Publication 25.09.2019
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Year of Publication 25.09.2019
Patent