Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity
Sato, Yosuke, Ishikawa, Kenji, Tsutsumi, Takayoshi, Ui, Akio, Akita, Masato, Oka, Shotaro, Hori, Masaru
Published in Journal of physics. D, Applied physics (24.06.2020)
Published in Journal of physics. D, Applied physics (24.06.2020)
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Journal Article
Sub-45 nm SiO 2 Etching with Stacked-Mask Process Using High-Bias-Frequency Dual-Frequency-Superimposed RF Capacitively Coupled Plasma
Kikutani, Keisuke, Ohashi, Takashi, Kojima, Akihiro, Sakai, Itsuko, Abe, Junko, Hayashi, Hisataka, Ui, Akio, Ohiwa, Tokuhisa
Published in Japanese Journal of Applied Physics (01.10.2008)
Published in Japanese Journal of Applied Physics (01.10.2008)
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Journal Article
Dielectric barrier discharge electrode and dielectric barrier discharge device
Yasui, Hiroyuki, Takamatsu, Tomonao, Ui, Akio, Matsuda, Shinya, Sato, Yosuke, Akita, Masato, Oka, Shotaro
Year of Publication 08.11.2022
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Year of Publication 08.11.2022
Patent
Dry etching method and method for manufacturing semiconductor device
Ui, Akio, Kikutani, Keisuke, Sato, Yosuke, Narumiya, Kaori, Hayashi, Hisataka
Year of Publication 25.06.2019
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Year of Publication 25.06.2019
Patent
Substrate processing apparatus and substrate processing method
Kaminatsui, Takeshi, Ui, Akio, Yamada, Norikazu, Ohse, Takeshi, Abe, Jun, Hayashi, Hisataka, Himori, Shinji
Year of Publication 20.08.2019
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Year of Publication 20.08.2019
Patent
Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam
Ito Junichi, Ohsawa Yuichi, Kamata Chikayoshi, Kashiwada Saori, Yakabe Megumi, Ui Akio
Year of Publication 24.10.2017
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Year of Publication 24.10.2017
Patent
Plasma processing apparatus of substrate and plasma processing method thereof
Ui, Akio, Ichikawa, Takashi, Tamaoki, Naoki, Hayashi, Hisataka, Kojima, Akihiro
Year of Publication 28.08.2012
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Year of Publication 28.08.2012
Patent