Effective surface treatments for selective epitaxial SiGe growth in locally strained pMOSFETs
Cheng, P L, Liao, C I, Wu, H R, Chen, Y C, Chien, C C, Yang, C L, Tzou, S F, Tang, J, Kodali, R, Washington, L, Cho, Y, Chang, V C, Fu, T, Hsu, W S
Published in Semiconductor science and technology (01.01.2007)
Published in Semiconductor science and technology (01.01.2007)
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Conference Proceeding
Effectiveness of Si thin buffer layer for selective SiGe epitaxial growth in recessed source and drain for pMOS
Cheng, P.L., Liao, C.I., Chien, C.C., Yang, C.L., Ting, S.F., Jeng, L.S., Huang, C.T., Cheng, Osbert, Tzou, S.F., Hsu, W.S.
Published in Materials chemistry and physics (15.02.2008)
Published in Materials chemistry and physics (15.02.2008)
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Journal Article
vMask(R) Usage in Semiconductor Foundry Manufacturing
Li, Ching I, Lai, Hsien Hsiu, Liu, Ron, Chen, Chao Chun, Wang, Y R, Chan, Michael, Yang, Chan Lon, Tzou, S F, Guo, Baonian, Jo, Sungho, Shim, Kyu-ha, Kim, Youn Ki, Henry, Todd
Published in Ion Implantation Technology 2008 (01.01.2008)
Published in Ion Implantation Technology 2008 (01.01.2008)
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Journal Article
Effectiveness of Si Seed for Selective SiGe Epitaxial Deposition in Recessed Source and Drain for Locally Strained pMOS Application
Cheng, Po Lun, Liao, Chin I, Wu, Hou Ren, Chen, Yi Cheng, Chien, Chin Cheng, Yang, Chan Lon, Tzou, S F, Tang, Jinsong, Cho, Yonah, Sanchez, Errol, Chang, Vincent C, Fu, Tony, Hsu, Wen S.
Published in ECS transactions (20.10.2006)
Published in ECS transactions (20.10.2006)
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A novel fabrication process to downscale SiON gate dielectrics (EOT = 1.06 nm, Jgn = 8.5 A/cm/sup 2/) toward sub-65nm and beyond
Wang, Y.R., Ying, Y.W., Chien Hua Lung, Chiang, W.T., Hsu, E., Lu, M.F., Lin, C., Lou, R.F., Cheng, L.Y., Chen, C.P., Chan, M., Cheng, O., Huang, K.T., Tzou, S.F., Sun, S.W.
Published in Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005 (2005)
Published in Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005 (2005)
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Conference Proceeding
A 28nm poly/SiON CMOS technology for low-power SoC applications
Liang, C. W., Chen, M. T., Jenq, J. S., Lien, W. Y., Huang, C. C., Lin, Y. S., Tzau, B. J., Wu, W. J., Fu, Z. H., Wang, I. C., Chou, P. Y., Fu, C. S., Tzeng, C. Y., Chiu, K. L., Huang, L. S., You, J. W., Hung, J. G., Cheng, Z. M., Hsu, B. C., Wang, H. Y., Ye, Y. H., Wu, J. Y., Yang, C. L., Chien, C. C., Wang, Y. R., Liu, C. C., Tzou, S. F., Huang, Y. H., Yu, C. C., Liao, J. H., Lin, C. L., Chen, D. F., Chien, S. C., Chen, I. C.
Published in 2011 Symposium on VLSI Technology - Digest of Technical Papers (01.06.2011)
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Published in 2011 Symposium on VLSI Technology - Digest of Technical Papers (01.06.2011)
Conference Proceeding
Advanced method to monitor design-process marginality for 65nm node and beyond
Hermes Liu, Huang, C., Tzou, S.F., Young, C., Tsui, D., Chang, E.
Published in 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2008)
Published in 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2008)
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Conference Proceeding
The determination of annealing program for NiSi formation
Published in 2005 13th International Conference on Advanced Thermal Processing of Semiconductors
(2005)
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Conference Proceeding
Superior Spike Annealing Performance in 65nm Source/Drain Extension Engineering
Li, C.I., Chin Cheng Chien, Huang, K.T., Po Yuan Chen, Hsiang Ying Wang, Tzou, S.F., Chen, S., Lin, J., Fu, T., Tandjaja, R., Ramamurthy, S., Chung, E., Chuang, J., Wen-Shan Chen
Published in 2005 13th International Conference on Advanced Thermal Processing of Semiconductors (2005)
Published in 2005 13th International Conference on Advanced Thermal Processing of Semiconductors (2005)
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Conference Proceeding
Using design based binning to improve defect excursion control for 45nm production
Huang, C., Young, C., Liu, H., Tzou, S.F., Tsui, D., Tsai, A., Chang, E.
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
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Conference Proceeding
Characteristics of HfZrOx gate stack engineering for reliability improvement on 28nm HK/MG CMOS technology
Tsai, C. H., Yang, C. W., Hsu, C. H., Lai, C. M., Lo, K. Y., Chen, C. G., Huang, R. M., Tsai, C. T., Hung, L. S., You, J. W., Hung, W. H., Chen, T. F., Cheng, O., Wu, J. Y., Tzou, S. F., Liang, C. W., Chen, I. C.
Published in Proceedings of Technical Program of 2012 VLSI Technology, System and Application (01.04.2012)
Published in Proceedings of Technical Program of 2012 VLSI Technology, System and Application (01.04.2012)
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Conference Proceeding
Control of Source and Drain Extension Phosphorus Profile by Using Carbon Co-Implant
Li, C.I., Ron Liu, Chan, M., Hsiao, T.F., Yang, C.L., Tzou, S.F.
Published in 2007 15th International Conference on Advanced Thermal Processing of Semiconductors (01.10.2007)
Published in 2007 15th International Conference on Advanced Thermal Processing of Semiconductors (01.10.2007)
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Conference Proceeding
A Novel High Tensile Stress SiN for Strained Silicon Technology Application
Tsai, Teng-Chun, Chen, N. K., Liao, H. L., Hsu, S. T., Huang, C. C., Tzou, S. F.
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
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Journal Article
Minimization of Trench Isolation Induced Stress Effects on Transistor Layout by SACVD
Hsu, S. T., Tsai, Teng-Chun, Chen, N. K., Hung, W. H., Huang, C. C., Tzou, S. F.
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
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Journal Article
Formation of Ni(Pt) Germanosilicide Using a Sacrificial Si Cap Layer
Yi-Wei Chen, Yu-Lan Chang, Yi-Cheng Chen, Shieh, K., Climbing Huang, Tzou, S.F.
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
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Conference Proceeding
Chemical and Plasma Oxidation Behaviors of NiSi and NiPtSi Salicide Films in 65nm Node CMOS Process
Yu-Lan Chang, Yi-Wei Chen, Yi-Cheng Chen, Shieh, K., Climbing Huang, Tzou, S.F.
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
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Conference Proceeding
Effective of Si Seed for Selective SiGe Epitaxial Deposition in Recessed Source and Drain for Locally Strained pMOS Application
Cheng, Po Lun, Liao, Chin I, Wu, Hou Ren, Chen, Yi Cheng, Chien, Chin Cheng, Yang, Chan Lon, Tzou, S F, Tang, Jinsong, Cho, Yonah, Sanchez, Errol, Chang, Vincent C, Fu, Tony
Published in Meeting abstracts (Electrochemical Society) (30.06.2006)
Published in Meeting abstracts (Electrochemical Society) (30.06.2006)
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Journal Article
Optimizing ALD WN Process for 65nm Node CMOS Contact Application
Chen, Y.-C., Hung, T.-Y., Chang, Y.-L., Shieh, K., Hsu, C.-L., Huang, C., Yan, W.H., Ashtiani, K., Pisharoty, D., Lei, W., Chang, S., Huang, F., Collins, J., Tzou, S.F.
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
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Conference Proceeding
Effective Surface Treatments for Selective Epitaxial SiGe Growth in Locally Strained pMOSFETs
Chin-I Liao, Yi-Cheng Chen, Po-Lun Cheng, Hsiang-Ying Wang, Chin-Cheng Chien, Chan-Lon Yang, Huang, K.T., Tzou, S.F., Jinsong Tang, Kodali, R., Washington, L., Chang, V.C., Fu, T., Yonah Cho
Published in 2006 International SiGe Technology and Device Meeting (2006)
Published in 2006 International SiGe Technology and Device Meeting (2006)
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Conference Proceeding