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Published in Japanese Journal of Applied Physics (01.04.2008)
Published in Japanese Journal of Applied Physics (01.04.2008)
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Year of Publication 22.06.2023
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Year of Publication 07.02.2023
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DEVICE AND METHOD FOR TREATING OXYGEN
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Year of Publication 08.12.2022
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Year of Publication 08.12.2022
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METHOD FOR PRODUCING PLATINUM FINE PARTICLES AND APPARATUS FOR PRODUCING THE SAME
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Year of Publication 16.03.2015
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Year of Publication 16.03.2015
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Contact resistance reduction of Pt-incorporated NiSi for continuous CMOS scaling ∼ Atomic level analysis of Pt/B/As distribution within silicide films
Sonehara, T., Hokazono, A., Akutsu, H., Sasaki, T., Uchida, H., Tomita, M., Tsujii, H., Kawanaka, S., Inaba, S., Toyoshima, Y.
Published in 2008 IEEE International Electron Devices Meeting (01.12.2008)
Published in 2008 IEEE International Electron Devices Meeting (01.12.2008)
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Conference Proceeding