POLYMER COMPOUND
ENDO KOTARO, TAKASU RYOICHI, OGATA TOSHIYUKI, SATO MITSURU, TSUJI HIROMITSU, YOSHIDA MASAAKI, HANEDA HIDEO
Year of Publication 26.02.2009
Get full text
Year of Publication 26.02.2009
Patent
PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
HOJO TAKUMA, OGATA TOSHIYUKI, SATO MITSURU, TSUJI HIROMITSU, HIROSAKI TAKAKO
Year of Publication 29.09.2005
Get full text
Year of Publication 29.09.2005
Patent
METHOD FOR REMOVING LIQUID AND METHOD FOR EVALUATING RESIST PATTERN USING SAME
UCHIUMI YOSHIYUKI, UCHIDA RYUSUKE, YAMADA SATOSHI, SEO TAKEHITO, TSUJI HIROMITSU, HOSONO TAKAYUKI, HAYASHI TOMOHIKO
Year of Publication 21.06.2007
Get full text
Year of Publication 21.06.2007
Patent
Resist elution study for immersion lithography
Sato, M., Yoshida, M., Ishizuka, K., Tsuji, l., Endo, K.
Published in Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004 (2004)
Published in Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004 (2004)
Get full text
Conference Proceeding