Ascidian sperm activating and attracting factor: Importance of sulfate groups for the activities and implication of its putative receptor
Yoshida, Manabu, Shiba, Kogiku, Yoshida, Kaoru, Tsuchikawa, Hiroshi, Ootou, Ouichirou, Oishi, Toru, Murata, Michio
Published in FEBS letters (15.10.2008)
Published in FEBS letters (15.10.2008)
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Journal Article
Synthesis and identification of an endogenous sperm activating and attracting factor isolated from eggs of the ascidian Ciona intestinalis; an example of nanomolar-level structure elucidation of novel natural compound
Oishi, Tohru, Tsuchikawa, Hiroshi, Murata, Michio, Yoshida, Manabu, Morisawa, Masaaki
Published in Tetrahedron (09.08.2004)
Published in Tetrahedron (09.08.2004)
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Journal Article
Kinetics of the ceramide kinase inhibitor K1, a suppressor of mast-cell activation
Kumada, H.(Hokkaido Univ., Sapporo (Japan). Faculty of Pharmaceutical Sciences), Mitsutake, S, Inagaki, Y, Mitsunaga, S, Tsuchikawa, H, Katsumura, S, Igarashi, Y
Published in Bioscience, biotechnology, and biochemistry (01.10.2007)
Published in Bioscience, biotechnology, and biochemistry (01.10.2007)
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Journal Article
Effects of line size on thermal stress in aluminum conductors
Hosoda, T., Niwa, H., Yagi, H., Tsuchikawa, H.
Published in 29th Annual Proceedings Reliability Physics 1991 (1991)
Published in 29th Annual Proceedings Reliability Physics 1991 (1991)
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Conference Proceeding
Improved pliers for removing temporary crowns
Yoshida, K, Yoda, M, Kimura, K, Tamazawa, Y, Tsuchikawa, H
Published in DE; the journal of dental engeering (1982)
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Published in DE; the journal of dental engeering (1982)
Journal Article
TiN-encapsulized copper interconnects for ULSI applications
Hoshino, K., Yagi, H., Tsuchikawa, H.
Published in Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference (1989)
Published in Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference (1989)
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Conference Proceeding
Novel dry cleaning using trisilane with a new single-wafer reactor
Mieno, F., Miyata, H., Tsukune, A., Furumura, Y., Tsuchikawa, H.
Published in International Technical Digest on Electron Devices (1990)
Published in International Technical Digest on Electron Devices (1990)
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Conference Proceeding
A 0.2- mu m contact filling by 450 degrees C-hydrazine-reduced TiN film with low resistivity
Suzuki, Ohba, Furumura, Tsuchikawa
Published in 1992 International Technical Digest on Electron Devices Meeting (1992)
Published in 1992 International Technical Digest on Electron Devices Meeting (1992)
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Conference Proceeding