Formation of thin film dielectrics by remote plasma-enhanced chemical-vapor deposition (remote PECVD)
Lucovsky, G., Tsu, D.V., Kim, S.S., Markunas, R.J., Fountain, G.G.
Published in Applied surface science (01.10.1989)
Published in Applied surface science (01.10.1989)
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Journal Article
Intermediate order in tetrahedrally coordinated silicon: evidence for chainlike objects
Tsu, David V., Chao, Benjamin S., Jones, Scott J.
Published in Solar energy materials and solar cells (01.07.2003)
Published in Solar energy materials and solar cells (01.07.2003)
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Journal Article
Low-temperature deposition of hydrogenated amorphous silicon (a-Si:H): Control of polyhydride incorporation and its effects on thin film properties
Lucovsky, G., Parsons, G.N., Wang, C., Davidson, B.N., Tsu, D.V.
Published in Solar cells (01.10.1989)
Published in Solar cells (01.10.1989)
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Journal Article
Conference Proceeding