Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO2 Films Using Contact Angle Titrations and X-ray Photoelectron Spectroscopy
Trevino, Kristina J., Shearer, Jeffrey C., Tompkins, Brendan D., Fisher, Ellen R.
Published in Plasma processes and polymers (21.10.2011)
Published in Plasma processes and polymers (21.10.2011)
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Journal Article
Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO 2 Films Using Contact Angle Titrations and X‐ray Photoelectron Spectroscopy
Trevino, Kristina J., Shearer, Jeffrey C., Tompkins, Brendan D., Fisher, Ellen R.
Published in Plasma processes and polymers (21.10.2011)
Published in Plasma processes and polymers (21.10.2011)
Get full text
Journal Article