Probing spatial heterogeneity in silicon thin films by Raman spectroscopy
Yamazaki, Hideyuki, Koike, Mitsuo, Saitoh, Masumi, Tomita, Mitsuhiro, Yokogawa, Ryo, Sawamoto, Naomi, Tomita, Motohiro, Kosemura, Daisuke, Ogura, Atsushi
Published in Scientific reports (29.11.2017)
Published in Scientific reports (29.11.2017)
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Mechanism of gate dielectric degradation by hydrogen migration from the cathode interface
Higashi, Yusuke, Takaishi, Riichiro, Kato, Koichi, Suzuki, Masamichi, Nakasaki, Yasushi, Tomita, Mitsuhiro, Mitani, Yuichiro, Matsumoto, Masuaki, Ogura, Shohei, Fukutani, Katsuyuki, Yamabe, Kikuo
Published in Microelectronics and reliability (01.03.2017)
Published in Microelectronics and reliability (01.03.2017)
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Improvement of P--N Junction Leakage and Reduction in Interface State Density in Transistors by Cryo Implantation Technology
Murakoshi, Atsushi, Iwase, Masao, Niiyama, Hiromi, Tomita, Mitsuhiro, Suguro, Kyoichi
Published in Japanese Journal of Applied Physics (01.10.2013)
Published in Japanese Journal of Applied Physics (01.10.2013)
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Journal Article
Mechanism of Contact Resistance Reduction in Nickel Silicide Films by Pt Incorporation
Sonehara, T., Hokazono, A., Akutsu, H., Sasaki, T., Uchida, H., Tomita, M., Kawanaka, S., Inaba, S., Toyoshima, Y.
Published in IEEE transactions on electron devices (01.11.2011)
Published in IEEE transactions on electron devices (01.11.2011)
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Journal Article
Final report on VAMAS round-robin study to evaluate a correction method for saturation effects in DSIMS
Takano, Akio, Nonaka, Hidehiko, Homma, Yoshikazu, Tomita, Mitsuhiro, Murase, Atsushi, Hayashi, Syunichi, Barozzi, Mario, Kim, Kyung Joon, Sykes, David, Simons, David, Bennett, Joe, Magee, Charles W.
Published in Surface and interface analysis (01.06.2015)
Published in Surface and interface analysis (01.06.2015)
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Ion-beam characteristics of the metal cluster complex of Ir4(CO)12
Fujiwara, Yukio, Kondou, Kouji, Teranishi, Yoshikazu, Nonaka, Hidehiko, Fujimoto, Toshiyuki, Kurokawa, Akira, Ichimura, Shingo, Tomita, Mitsuhiro
Published in Journal of applied physics (15.08.2006)
Published in Journal of applied physics (15.08.2006)
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Characteristics of a cluster-ion beam of Os3(CO)n+ (n = 7 or 8) for low-damage sputtering
Fujiwara, Yukio, Kondou, Kouji, Teranishi, Yoshikazu, Nonaka, Hidehiko, Fujimoto, Toshiyuki, Kurokawa, Akira, Ichimura, Shingo, Tomita, Mitsuhiro
Published in Surface and interface analysis (01.12.2006)
Published in Surface and interface analysis (01.12.2006)
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Conference Proceeding
Secondary Ion Mass Spectrometry of Organic Thin Films Using Metal-Cluster-Complex Ion Source
Fujiwara, Yukio, Kondou, Kouji, Nonaka, Hidehiko, Saito, Naoaki, Itoh, Hiroshi, Fujimoto, Toshiyuki, Kurokawa, Akira, Ichimura, Shingo, Tomita, Mitsuhiro
Published in Japanese Journal of Applied Physics (01.09.2006)
Published in Japanese Journal of Applied Physics (01.09.2006)
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Journal Article
Atom probe microscopy of three-dimensional distribution of silicon isotopes in Si 28 ∕ Si 30 isotope superlattices with sub-nanometer spatial resolution
Shimizu, Yasuo, Kawamura, Yoko, Uematsu, Masashi, Itoh, Kohei M., Tomita, Mitsuhiro, Sasaki, Mikio, Uchida, Hiroshi, Takahashi, Mamoru
Published in Journal of applied physics (08.10.2009)
Published in Journal of applied physics (08.10.2009)
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