Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology
Tokashiki, Ken, Cho, Hong, Banna, Samer, Lee, Jeong-Yun, Shin, Kyoungsub, Todorow, Valentin, Kim, Woo-Seok, Bai, KeunHee, Joo, Sukho, Choe, Jeong-Dong, Ramaswamy, Kartik, Agarwal, Ankur, Rauf, Shahid, Collins, Ken, Choi, SangJun, Cho, Han, Kim, Hyun Joong, Lee, Changhun, Lymberopoulos, Dimitris, Yoon, Junho, Han, Woosung, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.08.2009)
Published in Japanese Journal of Applied Physics (01.08.2009)
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Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor
Tokashiki, Ken, Bai, KeunHee, Baek, KyeHyun, Kim, Yongjin, Min, Gyungjin, Kang, Changjin, Cho, Hanku, Moon, Jootae
Published in Thin solid films (23.04.2007)
Published in Thin solid films (23.04.2007)
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Conference Proceeding
Mechanism and CHARM2 Evaluation of P-Channel Metal Oxide Semiconductor Threshold Voltage Drop during High Density Plasma Heat-up Process
Kim, Dong-Hwan, Lee, Jeongyun, Kim, Min-Sung, Tokashiki, Ken, Shin, Kyoungsub, Han, Woosung, Kang, Hyun-Il, Kim, Eung-Kwon, Song, Joon-Tae
Published in Japanese Journal of Applied Physics (01.08.2009)
Published in Japanese Journal of Applied Physics (01.08.2009)
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RuO2/TiN-based storage electrodes for (Ba, Sr)TiO3 dynamic random access memory capacitors
TAKEMURA, K, YAMAMICHI, S, LESAICHERRE, P.-Y, TOKASHIKI, K, MIYAMOTO, H, ONO, H, MIYASAKA, Y, YOSHIDA, M
Published in Japanese journal of applied physics (1995)
Published in Japanese journal of applied physics (1995)
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Conference Proceeding
Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching
Banna, S., Agarwal, A., Tokashiki, K., Hong Cho, Rauf, S., Todorow, V., Ramaswamy, K., Collins, K., Stout, P., Jeong-Yun Lee, Junho Yoon, Kyoungsub Shin, Sang-Jun Choi, Han-Soo Cho, Hyun-Joong Kim, Changhun Lee, Lymberopoulos, D.
Published in IEEE transactions on plasma science (01.09.2009)
Published in IEEE transactions on plasma science (01.09.2009)
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