Selective Plasma Surface Modification of Resist for Patterning Hydrophobic and Hydrophilic Regions
Tohno, Ichiro, Ikagawa, Masakuni, Shinmura, Tadashi, Kataoka, Yoshinori, Okudaira, Koji, Ueno, Nobuo, Sugita, Kazuyuki
Published in Japanese Journal of Applied Physics (01.03.2008)
Published in Japanese Journal of Applied Physics (01.03.2008)
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Journal Article
Optical Waveguide Biosensors for Highly Sensitive and High-Throughput Applications
Uematsu, Ikuo, Tohno, Ichiro, Kasai, Shingo, Hirakawa, Masaaki, Omiya, Kayoko, Matsumoto, Hidetoshi
Published in MRS advances (01.01.2016)
Published in MRS advances (01.01.2016)
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Journal Article
Study on Surface Modification of Indium Tin Oxide and Resist Surfaces Using CF 4 /O 2 Plasma for Manufacturing Organic Light-Emitting Diodes by Inkjet Printing
Ikagawa, Masakuni, Tohno, Ichiro, Shinmura, Tadashi, Takagi, Shigeyuki, Kataoka, Yoshinori, Fujihira, Masamichi
Published in Japanese Journal of Applied Physics (01.12.2008)
Published in Japanese Journal of Applied Physics (01.12.2008)
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Journal Article
Dry processing apparatus and dry processing method
Takagi, Shigeyuki, Saito, Makoto, Onoue, Seiji, Tohno, Ichiro, Nishimura, Hiroshi
Year of Publication 11.06.2002
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Year of Publication 11.06.2002
Patent
Dry processing apparatus and dry processing method
NISHIMURA HIROSHI, TOHNO ICHIRO, SAITO MAKOTO, TAKAGI SHIGEYUKI, ONOUE SEIJI
Year of Publication 11.06.2002
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Year of Publication 11.06.2002
Patent