Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors
Williams, P.A., Jones, A.C., Tobin, N.L., Chalker, P.R., Taylor, S., Marshall, P.A., Bickley, J.F., Smith, L.M., Davies, H.O., Critchlow, G.W.
Published in Advanced materials (Weinheim) (17.12.2003)
Published in Advanced materials (Weinheim) (17.12.2003)
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Journal Article
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water
Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Jones, A.C., Tobin, N.L.
Published in Chemical vapor deposition (01.03.2004)
Published in Chemical vapor deposition (01.03.2004)
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Journal Article
Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films
Williams, P. A., Roberts, J. L., Jones, A. C., Chalker, P. R., Tobin, N. L., Bickley, J. F., Davies, H. O., Smith, L. M., Leedham, T. J.
Published in Chemical vapor deposition (04.07.2002)
Published in Chemical vapor deposition (04.07.2002)
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Synthesis and characterisation of four new heterometal alkoxides: potential precursors for the MOCVD of ferroelectric oxides
JONES, Anthony C, TOBIN, Neil L, MARSHALL, Paul A, POTTER, Richard J, CHALKER, Paul R, BICKLEY, Jamie F, DAVIES, Hywel O, SMITH, Lesley M, CRITCHLOW, Gary W
Published in Journal of materials chemistry (2004)
Published in Journal of materials chemistry (2004)
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Improved precursors for the mocvd of sbt, sbn and sbtn
Leedham, Timothy J., Jones, Anthony C., Davies, Hywel O., Tobin, Neil L., Williams, Paul A., Bickley, Jamie F., Steiner, Alexander
Published in Integrated ferroelectrics (01.01.2001)
Published in Integrated ferroelectrics (01.01.2001)
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Journal Article
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water
Kukli, Kaupo, Ritala, Mikko, Leskelae, Markku, Sajavaara, Timo, Keinonen, Juhani, Jones, Anthony C., Tobin, Neil L.
Published in ChemInform (01.06.2004)
Published in ChemInform (01.06.2004)
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