Microstructural characterization of inlaid copper interconnect lines
BESSER, Paul R, ZSCHECH, Ehrenfried, BAKER, Brett, BRAECKELMANN, Greg, ZHAO, Larry, SIMPSON, Cindy, CAPASSO, Cristiano, KAWASAKI, Hisao, WEITZMAN, Elizabeth, BLUM, Werner, WINTER, Delrose, ORTEGA, Richard, ROSE, Stewart, HERRICK, Matt, GALL, Martin, THRASHER, Stacye, TINER, Mike
Published in Journal of electronic materials (01.04.2001)
Published in Journal of electronic materials (01.04.2001)
Get full text
Conference Proceeding
Journal Article
Modified cellulose morphologies and its composites; SEM and TEM analysis
Krishnamachari, Parakalan, Hashaikeh, Raed, Tiner, Mike
Published in Micron (Oxford, England : 1993) (01.12.2011)
Published in Micron (Oxford, England : 1993) (01.12.2011)
Get full text
Journal Article
Effect of rapid thermal annealing on crystallization and stress relaxation of SiGe nanoparticles deposited by ICP PECVDElectronic supplementary information (ESI) available. See DOI: 10.1039/c7ra04426g
Ravaux, Florent, Rajput, Nitul S, Abed, Jehad, George, Leslie, Tiner, Mike, Jouiad, Mustapha
Year of Publication 23.06.2017
Year of Publication 23.06.2017
Get full text
Journal Article
Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates
Tiezhong Ma, Campbell, S.A., Smith, R., Hoilien, N., Boyong He, Gladfelter, W.L., Hobbs, C., Buchanan, D., Taylor, C., Gribelyuk, M., Tiner, M., Coppel, M., Jang Jung Lee
Published in IEEE transactions on electron devices (01.10.2001)
Published in IEEE transactions on electron devices (01.10.2001)
Get full text
Journal Article
Observation of Precursor Control over Film Stoichiometry during the Chemical Vapor Deposition of Amorphous Ti x Si 1- x O 2 Films
Smith, Ryan C., Taylor, Charles J., Roberts, Jeffrey, Campbell, Stephen A., Tiner, Mike, Hegde, Rama, Hobbs, Christopher, Gladfelter, Wayne L.
Published in Chemistry of materials (01.10.2000)
Published in Chemistry of materials (01.10.2000)
Get full text
Journal Article
Observation of Precursor Control over Film Stoichiometry during the Chemical Vapor Deposition of Amorphous TixSi1-xO2 Films
SMITH, Ryan C., TAYLOR, Charles J., ROBERTS, Jeffrey, CAMPBELL, Stephen A., TINER, Mike, HEGDE, Rama, HOBBS, Christopher, GLADFELTER, Wayne L.
Published in Chemistry of materials (16.10.2000)
Published in Chemistry of materials (16.10.2000)
Get full text
Journal Article
Observation of Precursor Control over Film Stoichiometry during the Chemical Vapor Deposition of Amorphous Ti x Si1- x O2 Films
Smith, Ryan C, Taylor, Charles J, Roberts, Jeffrey, Campbell, Stephen A, Tiner, Mike, Hegde, Rama, Hobbs, Christopher, Gladfelter, Wayne L
Published in Chemistry of materials (16.10.2000)
Published in Chemistry of materials (16.10.2000)
Get full text
Journal Article