New Materials in Memory Development Sub 50 nm: Trends in Flash and DRAM
Kuesters, Karl Heinz, Beug, Marc Florian, Schroeder, Uwe, Nagel, Nicolas, Bewersdorff, Ulrike, Dallmann, Gerald, Jakschik, Stefan, Knoefler, Roman, Kudelka, Stephan, Ludwig, Christoph, Manger, Dirk, Mueller, Wolfgang, Tilke, Armin
Published in Advanced engineering materials (01.04.2009)
Published in Advanced engineering materials (01.04.2009)
Get full text
Journal Article
Highly Scalable Embedded Flash Memory With Deep Trench Isolation and Novel Buried Bitline Integration for the 90-nm Node and Beyond
Tilke, A.T., Pescini, L., Bauer, M., Stiftinger, M., Kakoschke, R., Shum, D., Chan, N., Sungrae Kim, Hecht, V., Kyung Joon Han
Published in IEEE transactions on electron devices (01.07.2007)
Published in IEEE transactions on electron devices (01.07.2007)
Get full text
Journal Article
Visualizing the doping profile of a silicon germanium HBT with polysilicon emitter using electron holography
Tilke, A.T., Lenk, A., Muhle, U., Wagner, C., Dahl, C., Lichte, H.
Published in IEEE transactions on electron devices (01.06.2005)
Published in IEEE transactions on electron devices (01.06.2005)
Get full text
Journal Article
Quarter micron BiCMOS technology platform with implanted-base- or SiGe-bipolar transistor for wireless communication ICs
Tilke, Armin T., Rothenhäußer, Steffen, Rochel, Markus, Stahrenberg, Knut, Goller, Klaus, Junge, Axel, Pribil, Andreas, Föste, Bernd, Wiedemann, Jörg, Tegeler, Martin, Berkner, Jörg, Wagner, Cajetan, Dahl, Claus
Published in Solid-state electronics (01.12.2004)
Published in Solid-state electronics (01.12.2004)
Get full text
Journal Article
New Materials in Memory Development Sub 50 nm: Trends in Flash and DRAM
Kuesters, Karl Heinz, Beug, Marc Florian, Schroeder, Uwe, Nagel, Nicolas, Bewersdorff, Ulrike, Dallmann, Gerald, Jakschik, Stefan, Knoefler, Roman, Kudelka, Stephan, Ludwig, Christoph, Manger, Dirk, Mueller, Wolfgang, Tilke, Armin
Published in Advanced engineering materials (01.06.2009)
Published in Advanced engineering materials (01.06.2009)
Get full text
Journal Article
Select Device Disturb Phenomenon in TANOS NAND Flash Memories
Melde, T., Beug, M.F., Bach, L., Tilke, A.T., Knoefler, R., Bewersdorff-Sarlette, U., Beyer, V., Czernohorsky, M., Paul, J., Mikolajick, T.
Published in IEEE electron device letters (01.05.2009)
Published in IEEE electron device letters (01.05.2009)
Get full text
Journal Article
SEMICONDUCTOR DEVICE
KOWALIK-SEIDL, Katarzyna, WIESINGER, Markus, TILKE, Armin, WILLMEROTH, Armin
Year of Publication 17.05.2023
Get full text
Year of Publication 17.05.2023
Patent
SEMICONDUCTOR DEVICE
Kowalik-Seidl, Katarzyna, Wiesinger, Markus, Tilke, Armin, Willmeroth, Armin
Year of Publication 11.05.2023
Get full text
Year of Publication 11.05.2023
Patent
Shallow Trench Isolation for the 45-nm CMOS Node and Geometry Dependence of STI Stress on CMOS Device Performance
Tilke, A.T., Stapelmann, C., Eller, M., Bach, K.-H., Hampp, R., Lindsay, R., Conti, R., Wille, W., Jaiswal, R., Galiano, M., Jain, A.
Published in IEEE transactions on semiconductor manufacturing (01.05.2007)
Published in IEEE transactions on semiconductor manufacturing (01.05.2007)
Get full text
Journal Article