Select Device Disturb Phenomenon in TANOS NAND Flash Memories
Melde, T., Beug, M.F., Bach, L., Tilke, A.T., Knoefler, R., Bewersdorff-Sarlette, U., Beyer, V., Czernohorsky, M., Paul, J., Mikolajick, T.
Published in IEEE electron device letters (01.05.2009)
Published in IEEE electron device letters (01.05.2009)
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Journal Article
Highly Scalable Embedded Flash Memory With Deep Trench Isolation and Novel Buried Bitline Integration for the 90-nm Node and Beyond
Tilke, A.T., Pescini, L., Bauer, M., Stiftinger, M., Kakoschke, R., Shum, D., Chan, N., Sungrae Kim, Hecht, V., Kyung Joon Han
Published in IEEE transactions on electron devices (01.07.2007)
Published in IEEE transactions on electron devices (01.07.2007)
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Journal Article
Visualizing the doping profile of a silicon germanium HBT with polysilicon emitter using electron holography
Tilke, A.T., Lenk, A., Muhle, U., Wagner, C., Dahl, C., Lichte, H.
Published in IEEE transactions on electron devices (01.06.2005)
Published in IEEE transactions on electron devices (01.06.2005)
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Journal Article
A low-cost fully self-aligned SiGe BiCMOS technology using selective epitaxy and a lateral quasi-single-poly integration concept
Tilke, A.T., Rochel, M., Berkner, J., Rothenhausser, S., Stahrenberg, K., Wiedemann, J., Wagner, C., Dahl, C.
Published in IEEE transactions on electron devices (01.07.2004)
Published in IEEE transactions on electron devices (01.07.2004)
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Journal Article
Influence of metal gate and capping film stress on TANOS cell performance
Czernohorsky, M., Melde, T., Beyer, V., Beug, M.F., Paul, J., Hoffmann, R., Knöfler, R., Tilke, A.T.
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
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Journal Article
Conference Proceeding
Shallow Trench Isolation for the 45-nm CMOS Node and Geometry Dependence of STI Stress on CMOS Device Performance
Tilke, A.T., Stapelmann, C., Eller, M., Bach, K.-H., Hampp, R., Lindsay, R., Conti, R., Wille, W., Jaiswal, R., Galiano, M., Jain, A.
Published in IEEE transactions on semiconductor manufacturing (01.05.2007)
Published in IEEE transactions on semiconductor manufacturing (01.05.2007)
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Journal Article
Coulomb blockade in silicon nanostructures
Tilke, A.T, Simmel, F.C, Blick, R.H, Lorenz, H, Kotthaus, J.P
Published in Progress in Quantum Electronics (01.05.2001)
Published in Progress in Quantum Electronics (01.05.2001)
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Book Review
Journal Article
STI Gap-Fill Technology with High Aspect Ratio Process for 45nm CMOS and beyond
Tilke, A.T., Hampp, R., Stapelmann, C., Culmsee, M., Conti, R., Wille, W., Jaiswal, R., Galiano, M., Jain, A.
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
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Conference Proceeding
Metal control gate for sub-30nm floating gate NAND memory
Chan, N., Beug, M.F., Knoefler, R., Mueller, T., Melde, T., Ackermann, M., Riedel, S., Specht, M., Ludwig, C., Tilke, A.T.
Published in 2008 9th Annual Non-Volatile Memory Technology Symposium (NVMTS) (01.11.2008)
Published in 2008 9th Annual Non-Volatile Memory Technology Symposium (NVMTS) (01.11.2008)
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Conference Proceeding
Highly scalable flash memory embedded into high-performance CMOS for the 90nm node and beyond
Shum, D., Tilke, A.T., Pescini, L., Kakoschke, R., Han, K.J.
Published in 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings (01.10.2006)
Published in 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings (01.10.2006)
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Conference Proceeding
Improvement of 48 nm TANOS NAND Cell Performance by Introduction of a Removable Encapsulation Liner
Beug, M.F., Melde, T., Paul, J., Bewersdorff-Sarlette, U., Czernohorsky, M., Beyer, V., Hoffmann, R., Seidel, K., Lohr, D.A., Bach, L., Knoefler, R., Tilke, A.T.
Published in 2009 IEEE International Memory Workshop (01.05.2009)
Published in 2009 IEEE International Memory Workshop (01.05.2009)
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Conference Proceeding
Novel Buried Bitline Integration for compact Cell Design in High-Performance embedded Flash Memory with Deep Trench Isolation
Tilke, A.T., Pescini, L., Stiftinger, M., Kakoschke, R., Shum, D., Chan, N., Kim, S.R., Han, K.J.
Published in 2006 21st IEEE Non-Volatile Semiconductor Memory Workshop (2006)
Published in 2006 21st IEEE Non-Volatile Semiconductor Memory Workshop (2006)
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Conference Proceeding
Highly scalable flash memory with novel deep trench isolation embedded into highperformance cmos for the 90nm node & beyond
Shum, D., Tilke, A.T., Pescini, L., Stiftinger, M., Kakoschke, R., Han, K.J., Kim, S.R., Hecht, V., Chan, N., Yang, A., Broze, R.
Published in IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest (2005)
Published in IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest (2005)
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Conference Proceeding