Fabrication of Vertically Stacked Nanosheet Junctionless Field-Effect Transistors and Applications for the CMOS and CFET Inverters
Sung, Po-Jung, Chang, Shu-Wei, Kao, Kuo-Hsing, Wu, Chien-Ting, Su, Chun-Jung, Cho, Ta-Chun, Hsueh, Fu-Kuo, Lee, Wen-Hsi, Lee, Yao-Jen, Chao, Tien-Sheng
Published in IEEE transactions on electron devices (01.09.2020)
Published in IEEE transactions on electron devices (01.09.2020)
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Reliability of p-Type Pi-Gate Poly-Si Nanowire Channel Junctionless Accumulation-Mode FETs
Hsieh, Dong-Ru, Lin, Kun-Cheng, Lee, Chia-Chin, Chao, Tien-Sheng
Published in IEEE transactions on electron devices (01.06.2021)
Published in IEEE transactions on electron devices (01.06.2021)
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Gate-All-Around Junctionless Transistors With Heavily Doped Polysilicon Nanowire Channels
Su, Chun-Jung, Tsai, Tzu-I, Liou, Yu-Ling, Lin, Zer-Ming, Lin, Horng-Chih, Chao, Tien-Sheng
Published in IEEE electron device letters (01.04.2011)
Published in IEEE electron device letters (01.04.2011)
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Single‐Gate In‐Transistor Readout of Current Superposition and Collapse Utilizing Quantum Tunneling and Ferroelectric Switching
Chen, Ching‐Hung, Lai, Yu‐Ting, Chen, Ciao‐Fen, Wu, Pei‐Tzu, Su, Kuan‐Jung, Hsu, Sheng‐Yang, Dai, Guo‐Jin, Huang, Zan‐Yi, Hsu, Chien‐Lung, Lee, Shen‐Yang, Shen, Chuan‐Hui, Chen, Hsin‐Yu, Lee, Chia‐Chin, Hsieh, Dong‐Ru, Lin, Yen‐Fu, Chao, Tien‐Sheng, Lo, Shun‐Tsung
Published in Advanced materials (Weinheim) (01.08.2023)
Published in Advanced materials (Weinheim) (01.08.2023)
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Comprehensive Analysis on Electrical Characteristics of Pi-Gate Poly-Si Junctionless FETs
Hsieh, Dong-Ru, Lin, Jer-Yi, Kuo, Po-Yi, Chao, Tien-Sheng
Published in IEEE transactions on electron devices (01.07.2017)
Published in IEEE transactions on electron devices (01.07.2017)
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Effect of Seed Layer on Gate-All-Around Poly-Si Nanowire Negative-Capacitance FETs With MFMIS and MFIS Structures: Planar Capacitors to 3-D FETs
Lee, Shen-Yang, Chen, Han-Wei, Shen, Chiuan-Huei, Kuo, Po-Yi, Chung, Chun-Chih, Huang, Yu-En, Chen, Hsin-Yu, Chao, Tien-Sheng
Published in IEEE transactions on electron devices (01.02.2020)
Published in IEEE transactions on electron devices (01.02.2020)
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High-Performance Pi-Gate Poly-Si Junctionless and Inversion Mode FET
Hsieh, Dong-Ru, Lin, Jer-Yi, Kuo, Po-Yi, Chao, Tien-Sheng
Published in IEEE transactions on electron devices (01.11.2016)
Published in IEEE transactions on electron devices (01.11.2016)
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Journal Article
Experimental Demonstration of Stacked Gate- All-Around Poly-Si Nanowires Negative Capacitance FETs With Internal Gate Featuring Seed Layer and Free of Post-Metal Annealing Process
Lee, Shen-Yang, Chen, Han-Wei, Shen, Chiuan-Huei, Kuo, Po-Yi, Chung, Chun-Chih, Huang, Yu-En, Chen, Hsin-Yu, Chao, Tien-Sheng
Published in IEEE electron device letters (01.11.2019)
Published in IEEE electron device letters (01.11.2019)
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Highly Stable Short Channel Ultrathin Atomic Layer Deposited Indium Zinc Oxide Thin Film Transistors With Excellent Electrical Characteristics
Liang, Yan-Kui, Li, Wei-Li, Zheng, Jun-Yang, Lin, Yu-Lon, Lu, Yu-Cheng, Chiu, Ching-Hua, Hsieh, Dong-Ru, Chou, Tsung-Te, Kei, Chi-Chung, Huang, Huai-Ying, Lin, Yu-Ming, Tseng, Yuan-Chieh, Chao, Tien-Sheng, Chang, Edward Yi, Lin, Chun-Hsiung
Published in IEEE electron device letters (01.10.2023)
Published in IEEE electron device letters (01.10.2023)
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Improving the Electrical Performance of a Quantum Well FET With a Shell Doping Profile by Heterojunction Optimization
Kumar, Malkundi Puttaveerappa Vijay, Chia-Ying Hu, Walke, Amey Mahadev, Kuo-Hsing Kao, Tien-Sheng Chao
Published in IEEE transactions on electron devices (01.09.2017)
Published in IEEE transactions on electron devices (01.09.2017)
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A Harmonic Radar Tag with High Detection Range Utilizing Ge FinFETs CMOS Technology
Hsieh, Cheng-Hung, Hong, Tzu-Chieh, Yang, Chiung-Yi, Chen, Yi-Ho, Yu, Xin-Ren, Lu, Wen-Hsiang, Chuang, Ricky W., Tsai, Zuo-Min, Lee, Yao-Jen, Li, YiMing, Wu, Wen-Fa, Chao, Tien-Sheng, Samukawa, Seiji, Wang, Yeong-Her, Yeh, Wen-Kuan, Tarng, Jenn-Hwan
Published in IEEE electron device letters (01.11.2022)
Published in IEEE electron device letters (01.11.2022)
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Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review
Lee, Yao-Jen, Cho, Ta-Chun, Chuang, Shang-Shiun, Hsueh, Fu-Kuo, Lu, Yu-Lun, Sung, Po-Jung, Chen, Hsiu-Chih, Current, Michael I., Tseng, Tseung-Yuen, Chao, Tien-Sheng, Hu, Chenming, Yang, Fu-Liang
Published in IEEE transactions on electron devices (01.03.2014)
Published in IEEE transactions on electron devices (01.03.2014)
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