Chemisorption of ALD precursors in and on porous low-k films
Verdonck, P., Delabie, A., Swerts, J., Farrell, L., Baklanov, M.R., Tielens, H., Van Besien, E., Witters, T., Nyns, L., Van Elshocht, S.
Published in Microelectronic engineering (01.06.2013)
Published in Microelectronic engineering (01.06.2013)
Get full text
Journal Article
Conference Proceeding
Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films
Godavarthi, S., Wang, C., Verdonck, P., Matsumoto, Y., Koudriavtsev, I., Dutt, A., Tielens, H., Baklanov, M.R.
Published in Thin solid films (30.01.2015)
Published in Thin solid films (30.01.2015)
Get full text
Journal Article
An X-ray photoelectron spectroscopy study of strontium-titanate-based high-k film stacks
Sygellou, L., Tielens, H., Adelmann, C., Ladas, S.
Published in Microelectronic engineering (01.02.2012)
Published in Microelectronic engineering (01.02.2012)
Get full text
Journal Article
Conference Proceeding
Medium energy ion scattering for the high depth resolution characterisation of high-k dielectric layers of nanometer thickness
van den Berg, J.A., Reading, M.A., Bailey, P., Noakes, T.Q.C., Adelmann, C., Popovici, M., Tielens, H., Conard, T., de Gendt, S., van Elshocht, S.
Published in Applied surface science (15.09.2013)
Published in Applied surface science (15.09.2013)
Get full text
Journal Article
Conference Proceeding
TiN/STO/TiN MIMcaps nanolayers on silicon characterized by SIMS and AFM
Barozzi, M., Iacob, E., van den Berg, J.A., Reading, M.A., Adelmann, C., Popovici, M., Tielens, H, Bersani, M.
Published in Surface and interface analysis (01.01.2013)
Published in Surface and interface analysis (01.01.2013)
Get full text
Journal Article
Conference Proceeding
Atomic Layer Deposition of Gd-Doped HfO[sub 2] Thin Films
Adelmann, C., Tielens, H., Dewulf, D., Hardy, A., Pierreux, D., Swerts, J., Rosseel, E., Shi, X., Van Bael, M. K., Kittl, J. A., Van Elshocht, S.
Published in Journal of the Electrochemical Society (2010)
Published in Journal of the Electrochemical Society (2010)
Get full text
Journal Article
Process-improved RRAM cell performance and reliability and paving the way for manufacturability and scalability for high density memory application
Kar, G. S., Fantini, A., Chen, Y.-Y, Paraschiv, V., Govoreanu, B., Hody, H., Jossart, N., Tielens, H., Brus, S., Richard, O., Vandeweyer, T., Wouters, D. J., Altimime, L., Jurczak, M.
Published in 2012 Symposium on VLSI Technology (VLSIT) (01.06.2012)
Published in 2012 Symposium on VLSI Technology (VLSIT) (01.06.2012)
Get full text
Conference Proceeding
Process control & integration options of RMG technology for aggressively scaled devices
Veloso, A., Higuchi, Y., Chew, S. A., Devriendt, K., Ragnarsson, L., Sebaai, F., Schram, T., Brus, S., Vecchio, E., Kellens, K., Rohr, E., Eneman, G., Simoen, E., Cho, M. J., Paraschiv, V., Crabbe, Y., Shi, X., Tielens, H., Van Ammel, A., Dekkers, H., Favia, P., Geypen, J., Bender, H., Phatak, A., del Agua Borniquel, J., Xu, K., Allen, M., Liu, C., Xu, T., Yoo, W. S., Thean, A., Horiguchi, N.
Published in 2012 Symposium on VLSI Technology (VLSIT) (01.06.2012)
Published in 2012 Symposium on VLSI Technology (VLSIT) (01.06.2012)
Get full text
Conference Proceeding
Advanced Capacitor Dielectrics: Towards 2x nm DRAM
Kim, M.-S, Popovici, M, Swerts, J, Pawlak, M A, Tomida, K, Kaczer, B, Opsomer, K, Schaekers, M, Tielens, H, Vrancken, C, Van Elshocht, S, Debusschere, I, Altimime, L, Kittl, J A
Published in 2011 3rd IEEE International Memory Workshop (IMW) (01.05.2011)
Published in 2011 3rd IEEE International Memory Workshop (IMW) (01.05.2011)
Get full text
Conference Proceeding
Development of ALD HfZrO[sub x] with TDEAH/TDEAZ and H[sub 2]O
Shi, X., Tielens, H., Takeoka, S., Nakabayashi, T., Nyns, L., Adelmann, C., Delabie, A., Schram, T., Ragnarsson, L., Schaekers, M., Date, L., Schreutelkamp, R., Van Elshocht, S.
Published in Journal of the Electrochemical Society (2011)
Published in Journal of the Electrochemical Society (2011)
Get full text
Journal Article
Lanthanide Aluminates as Dielectrics for Non-Volatile Memory Applications: Material Aspects
Adelmann, C., Swerts, J., Richard, O., Conard, T., Popovici, M., Meersschaut, J., Afanas’ev, V. V., Breuil, L., Cacciato, A., Opsomer, K., Brijs, B., Tielens, H., Pourtois, G., Bender, H., Jurczak, M., Houdt, J. Van, Elshocht, S. Van, Kittl, J. A.
Published in Journal of the Electrochemical Society (01.08.2011)
Published in Journal of the Electrochemical Society (01.08.2011)
Get full text
Journal Article
Gate-last vs. gate-first technology for aggressively scaled EOT logic/RF CMOS
Veloso, A., Ragnarsson, L.-A, Cho, M. J., Devriendt, K., Kellens, K., Sebaai, F., Suhard, S., Brus, S., Crabbe, Y., Schram, T., Rohr, E., Paraschiv, V., Eneman, G., Kauerauf, T., Dehan, M., Hong, S.-H, Yamaguchi, S., Takeoka, S., Higuchi, Y., Tielens, H., Van Ammel, A., Favia, P., Bender, H., Franquet, A., Conard, T., Li, X., Pey, K.-L, Struyf, H., Mertens, P., Absil, P. P., Horiguchi, N., Hoffmann, T.
Published in 2011 Symposium on VLSI Technology - Digest of Technical Papers (01.06.2011)
Get full text
Published in 2011 Symposium on VLSI Technology - Digest of Technical Papers (01.06.2011)
Conference Proceeding
The Effects of Plasma Treatments and Subsequent Atomic Layer Deposition on the Pore Structure of a k = 2.0 Low-k Material
Verdonck, P., Maheshwari, A., Swerts, J., Delabie, A., Witters, T., Tielens, H., Dewilde, S., Franquet, A., Meersschaut, J., Conard, T., Prado, J. Loyo, Armini, S., Baklanov, M. R., Van Elshocht, S., Uedono, A., Huanca, Danilo Roque, dos Santos Filho, S. Gomes, Kellerman, Guinther
Published in ECS journal of solid state science and technology (01.01.2013)
Published in ECS journal of solid state science and technology (01.01.2013)
Get full text
Journal Article
CMOS-Compatible Dielectric Constant Engineering by Embedding Metallic Particles in Aluminum Oxide
Put, Brecht, Adelmann, Christoph, Swerts, Johan, Rooyackers, Rita, Tielens, Hilde, Elshocht, Sven Van, Heyns, Marc, Radu, Iuliana P.
Published in ECS solid state letters (01.01.2013)
Published in ECS solid state letters (01.01.2013)
Get full text
Journal Article
Atomic-Layer Deposition of Lutetium Aluminate Thin Films for Non-Volatile Memory Applications
Adelmann, Christoph, Swerts, Johan, Conard, Thierry, Brijs, Bert, Franquet, Alexis, Hardy, An, Tielens, Hilde, Opsomer, Karl, Moussa, Alain, Van Bael, Marlies K., Jurczak, Malgorzata, Kittl, Jorge A., Van Elshocht, Sven
Published in ECS transactions (01.01.2011)
Published in ECS transactions (01.01.2011)
Get full text
Journal Article
(Invited) Rare Earth Materials for Semiconductor Applications
Van Elshocht, Sven, Adelmann, Christoph, Popovici, Mihaela, Swerts, Johan, Delabie, Annelies, Nyns, Laura, Shi, Xiaoping, Tielens, Hilde, Brijs, Bert, Pourtois, Geoffrey, Schram, Tom, Pierreux, Dieter, Maes, Jan-Willem, Hardy, An, Van Bael, Marlies K., Kittl, Jorge A.
Published in ECS transactions (01.01.2010)
Published in ECS transactions (01.01.2010)
Get full text
Journal Article
On the Process and Material Sensitivities for High-k Based Dielectrics
Van Elshocht, Sven, Adelmann, Christoph, Popovici, Mihaela, Swerts, Johan, Delabie, Annelies, Nyns, Laura, Shi, Xiaoping, Tielens, Hilde, Pourtois, Geoffrey, Menou, Nicolas, Breuil, Laurent, Pierreux, Dieter, Maes, Jan-Willem, Hardy, An, Van Bael, Marlies K., Jurczak, Malgorzata, Kittl, Jorge A.
Published in ECS transactions (01.01.2010)
Published in ECS transactions (01.01.2010)
Get full text
Journal Article
Fundamental study of atomic layer deposition in and on porous low-k films
Verdonck, P., Delabie, A., Swerts, J., Farrell, L., Baklanov, M. R., Tielens, H., Van Besien, E., Witters, J., Nyns, L., Van Elshocht, S.
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
Get full text
Conference Proceeding
Dual-channel technology with cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
Witters, L., Mitard, J., Veloso, A., Hikavyy, A., Franco, J., Kauerauf, T., Cho, M., Schram, T., Sebai, F., Yamaguchi, S., Takeoka, S., Fukuda, M., Wang, W.-E, Duriez, B., Eneman, G., Loo, R., Kellens, K., Tielens, H., Favia, P., Rohr, E., Hellings, G., Bender, H., Roussel, P., Crabbe, Y., Brus, S., Mannaert, G., Kubicek, S., Devriendt, K., De Meyer, K., Ragnarsson, L.-A, Steegen, A., Horiguchi, N.
Published in 2011 International Electron Devices Meeting (01.12.2011)
Published in 2011 International Electron Devices Meeting (01.12.2011)
Get full text
Conference Proceeding