LITHOGRAPHIC FEASIBILITY OF ESCAP BEYOND QUARTER MICRON
ITO, Hiroshi, BREYTA, Greg, CONLEY, Will, HAGERTY, Pete, THACKERAY, Jim, HOLMES, Steve, NUNES, Ron, FENZEL-ALEXANDER, Debra, DIPIETRO, Rick, HOFER, Don
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
Get full text
Journal Article
KRS: An Environmentally Robutst Resist Based on Fast Reaction kinetics
Huang, Wu-Song, Katnani, Ahmad D., Yang, Dominic, Brunsvold, Bill, Bantu, Rao, Khojasteh, Mahmoud, Sooriyakumaran, R., Kwong, Ranee, Lee, Kim Y., Hefferon, George, Orsula, George, Cameron, Jim, Denison, Mark, Sinta, Roger, Thackeray, Jim
Published in Journal of photopolymer science and technology (1995)
Published in Journal of photopolymer science and technology (1995)
Get full text
Journal Article
KRS: An Environmentally Robust Resist Based on Fast Reaction Kinetics
Huang, Wu-Song, Katnani, Ahmad D., Yang, Dominic, Brunsvold, Bill, Bantu, Rao, Khojasteh, Mahmoud, Sooriyakumaran, R., Kwong, Ranee, Lee, Kim Y., Hefferon, George, Orsula, George, Cameron, Jim, Denison, Mark, Sinta, Roger, Thackeray, Jim
Published in Journal of Photopolymer Science and Technology (1995)
Published in Journal of Photopolymer Science and Technology (1995)
Get full text
Journal Article