Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon
Tezani, L.L., Pessoa, R.S., Moraes, R.S., Medeiros, H.S., Martins, C.A., Maciel, H.S., Petraconi Filho, G., Massi, M., da Silva Sobrinho, A. S.
Published in Contributions to plasma physics (1988) (01.10.2012)
Published in Contributions to plasma physics (1988) (01.10.2012)
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Journal Article
Automation of a Mass Flow Controller for Application in Time‐Multiplex SF 6 +CH 4 Plasma Etching of Silicon
Tezani, L.L., Pessoa, R.S., Moraes, R.S., Medeiros, H.S., Martins, C.A., Maciel, H.S., Petraconi Filho, G., Massi, M., da Silva Sobrinho, A. S.
Published in Contributions to plasma physics (1988) (01.10.2012)
Published in Contributions to plasma physics (1988) (01.10.2012)
Get full text
Journal Article