Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Li, X., Goodhue, W.D., Santeufeimio, C., Tetreault, T.G., MacCrimmon, R., Allen, L.P., Bliss, D., Krishnaswami, K., Sung, C.
Published in Applied surface science (30.09.2003)
Published in Applied surface science (30.09.2003)
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