Properties of Ti[O.sub.2] films on silicon substrate
Kalygina, V.M, Novikov, V.A, Petrova, Yu. S, Tolbanov, O.P, Chernikov, E.V, Tcupiy, S. Yu, Yaskevich, T.M
Published in Semiconductors (Woodbury, N.Y.) (01.06.2014)
Published in Semiconductors (Woodbury, N.Y.) (01.06.2014)
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Journal Article
Effect of thermal annealing and exposure to oxygen plasma on the properties of TiO2-Si structures
Kalygina, V. M., Novikov, V. A., Petrova, Yu. S., Tolbanov, O. P., Chernikov, E. V., Tcupiy, S. Yu, Yaskevich, T. M.
Published in Semiconductors (Woodbury, N.Y.) (01.07.2014)
Published in Semiconductors (Woodbury, N.Y.) (01.07.2014)
Get full text
Journal Article
Properties of TiO2 films on silicon substrate
Kalygina, V. M., Novikov, V. A., Petrova, Yu. S., Tolbanov, O. P., Chernikov, E. V., Tcupiy, S. Yu, Yaskevich, T. M.
Published in Semiconductors (Woodbury, N.Y.) (01.06.2014)
Published in Semiconductors (Woodbury, N.Y.) (01.06.2014)
Get full text
Journal Article