Surface passivation of InGaP/GaAs HBT using silicon-nitride film deposited by ECR–CVD plasma
Manera, L.T., Zoccal, L.B., Diniz, J.A., Tatsch, P.J., Doi, I.
Published in Applied surface science (30.07.2008)
Published in Applied surface science (30.07.2008)
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Conference Proceeding
Work function measurements using a field emission retarding potential technique
Hamanaka, M H M O, Dall'Agnol, F F, Pimentel, V L, Mammana, V P, Tatsch, P J, den Engelsen, D
Published in Review of scientific instruments (01.03.2016)
Published in Review of scientific instruments (01.03.2016)
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The influence of poly-Si/SiGe gate in CMOS transistors for RF and microwave circuit applications
Jimenez, H. G., Manera, L. T., Rautemberg, M. F., Diniz, J. A., Doi, I., Tatsch, P. J., Figueroa, H. E., Swart, J. W.
Published in Physica status solidi. C (01.02.2010)
Published in Physica status solidi. C (01.02.2010)
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High quality of ultra-thin silicon oxynitride films formed by low-energy nitrogen implantation into silicon with additional plasma or thermal oxidation
Diniz, J.A, Sotero, A.P, Lujan, G.S, Tatsch, P.J, Swart, J.W
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (02.05.2000)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (02.05.2000)
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GaAs and AlGaAs reactive ion etching in SiCl4/Ar gas mixtures for HEMT applications
Nunes, A. M., Moshkalev, S. A., Tatsch, P. J., Duarte, C. A., Gusev, G. M.
Published in ECS transactions (21.09.2007)
Published in ECS transactions (21.09.2007)
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Reactive Ion Etching of Polyscrystalline Silicon Using Thinning Technology in Fluorine Based Mixtures
Nunes, A. M., Moshkalyov, S. A., Tatsch, P. J., Daltrini, A. M.
Published in ECS transactions (21.11.2007)
Published in ECS transactions (21.11.2007)
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The Influence of Poly-Si/SiGe Gate in Threshold, Sub-Threshold Parameters and Low Frequency Noise in p-MOSFETs
Jimenez Grados, Hugo R., Manera, Leandro T., Rautemberg Finardi, Márcia, Alexandre Diniz, José, Doi, Ioshiaki, Jurgen Tatsch, Peter, Enrique Figueroa, Hugo, W. Swart, Jacobus
Published in ECS transactions (04.09.2009)
Published in ECS transactions (04.09.2009)
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DC Performance and Low Frequency Noise in n-MOSFETs using Self-Aligned Poly-Si/SiGe Gate
Jimenez Grados, Hugo R., Manera, Leandro T., Cotrin Teixeira, Ricardo, Rautemberg, Marcia, Diniz, José A., Doi, Ioshiaki, Tatsch, Peter Jurgen, Hernandes Figueroa, Hugo Enrique, Swart, Jacobus W.
Published in ECS transactions (22.08.2008)
Published in ECS transactions (22.08.2008)
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