A study of 193-nm immersion lithography using novel high refractive index fluids
Santillan, Julius, Otoguro, Akihiko, Itani, Toshiro, Fujii, Kiyoshi, Kagayama, Akifumi, Nakano, Takashi, Nakayama, Norio, Tamatani, Hiroaki, Fukuda, Shin
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
PARTICLE CONTAINING CROSSLINKED POLYAMINO ACID
SUKEGAWA, MAKOTO, ISHITOKU, TAKESHI, FUKUOKA, AKIO, IRIZATO, YOSHIHIRO, FUKAWA, SUSUMU, KATOH, TOSHIO, MACHIDA, KATSUHIKO, TAMATANI, HIROAKI
Year of Publication 18.05.2000
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Year of Publication 18.05.2000
Patent