Structural analysis of TaWN ternary alloy film applicable to Cu orientation control
Takeyama, Mayumi B., Yasuda, Mitsunobu, Sato, Masaru
Published in Japanese Journal of Applied Physics (01.05.2021)
Published in Japanese Journal of Applied Physics (01.05.2021)
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Journal Article
Low-temperature-deposited insulating films of silicon nitride by reactive sputtering and plasma-enhanced CVD: Comparison of characteristics
Sato, Masaru, Takeyama, Mayumi B., Nakata, Yoshihiro, Kobayashi, Yasushi, Nakamura, Tomoji, Noya, Atsushi
Published in Japanese Journal of Applied Physics (01.04.2016)
Published in Japanese Journal of Applied Physics (01.04.2016)
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Journal Article
Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures
Takeyama, Mayumi B., Sato, Masaru, Nakata, Yoshihiro, Kobayashi, Yasushi, Nakamura, Tomoji, Noya, Atsushi
Published in Japanese Journal of Applied Physics (01.05.2014)
Published in Japanese Journal of Applied Physics (01.05.2014)
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Journal Article
Fundamental evaluation of orientation and grain size of Cu film in Cu/TaWN/SiO2/Si system
Sato, Masaru, Yasuda, Mitsunobu, Takeyama, Mayumi B.
Published in Japanese Journal of Applied Physics (01.07.2023)
Published in Japanese Journal of Applied Physics (01.07.2023)
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Journal Article
Characterization of TiHfN ternary alloy films as a barrier between Cu plug and Si
Takeyama, Mayumi B., Sato, Masaru, Aoyagi, Eiji, Noya, Atsushi
Published in Japanese Journal of Applied Physics (01.02.2014)
Published in Japanese Journal of Applied Physics (01.02.2014)
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Journal Article
XRD and EBSD analysis of Cu film on randomly oriented ZrNx film as the underlying materials
Sato, Masaru, Yasuda, Mitsunobu, Takeyama, Mayumi B.
Published in Japanese Journal of Applied Physics (01.07.2020)
Published in Japanese Journal of Applied Physics (01.07.2020)
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Journal Article
Barrier Properties of Thin ZrNx Films Prepared by Radical-Assisted Surface Reaction
Sato, Masaru, Takeyama, Mayumi B, Hayasaka, Yuichirou, Aoyagi, Eiji, Noya, Atsushi
Published in Jpn J Appl Phys (01.05.2011)
Published in Jpn J Appl Phys (01.05.2011)
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Journal Article
Atomic Layer Deposition of Thin VNx Film from Tetrakis(diethylamido)vanadium Precursor
Takeyama, Mayumi B, Sato, Masaru, Sudoh, Hiroshi, Machida, Hideaki, Ito, Shun, Aoyagi, Eiji, Noya, Atsushi
Published in Jpn J Appl Phys (01.05.2011)
Published in Jpn J Appl Phys (01.05.2011)
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Journal Article
Relationship between 〈111〉-oriented Cu film and thin Ta-W-N barrier
Takeyama, Mayumi B., Sato, Masaru, Yasuda, Mitsunobu
Published in Japanese Journal of Applied Physics (01.07.2020)
Published in Japanese Journal of Applied Physics (01.07.2020)
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Journal Article
Reactively Sputtered Nanocrystalline ZrN Film as Extremely Thin Diffusion Barrier between Cu and SiO2
Takeyama, Mayumi B, Sato, Masaru, Aoyagi, Eiji, Noya, Atsushi
Published in Jpn J Appl Phys (01.05.2010)
Published in Jpn J Appl Phys (01.05.2010)
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Journal Article
XRD and EBSD analysis of Cu film on randomly oriented ZrN x film as the underlying materials
Sato, Masaru, Yasuda, Mitsunobu, Takeyama, Mayumi B.
Published in Japanese Journal of Applied Physics (01.07.2020)
Published in Japanese Journal of Applied Physics (01.07.2020)
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Journal Article
Characterization of TiN films sputter-deposited at low temperatures for Cu-through-silicon via
Sato, Masaru, Kitada, Hideki, Takeyama, Mayumi B.
Published in Japanese Journal of Applied Physics (01.04.2019)
Published in Japanese Journal of Applied Physics (01.04.2019)
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Journal Article
Mapping of a Ni/SiNx/n-SiC structure using scanning internal photoemission microscopy
Shiojima, Kenji, Hashizume, Takanori, Sato, Masaru, Takeyama, Mayumi B.
Published in Japanese Journal of Applied Physics (22.02.2019)
Published in Japanese Journal of Applied Physics (22.02.2019)
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Journal Article
Mapping of a Ni/SiN x /n-SiC structure using scanning internal photoemission microscopy
Shiojima, Kenji, Hashizume, Takanori, Sato, Masaru, Takeyama, Mayumi B.
Published in Japanese Journal of Applied Physics (01.04.2019)
Published in Japanese Journal of Applied Physics (01.04.2019)
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Journal Article