Preparation of nanocrystalline cubic silicon carbide thin films by hot-wire CVD at various filament-to-substrate distances
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Conference Proceeding
Influence of gas pressure on low-temperature preparation and film properties of nanocrystalline 3C-SiC thin films by HW-CVD using SiH4/CH4/H2 system
KOMURA, Yusuke, TABATA, Akimori, NARITA, Tomoki, KONDO, Akihiro
Published in Thin solid films (01.01.2008)
Published in Thin solid films (01.01.2008)
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Conference Proceeding
Journal Article
Growth of silicon carbide thin films by hot-wire chemical vapor deposition from SiH4/CH4/H2
TABATA, Akimori, KOMURA, Yusuke, NARITA, Tomoki, KONDO, Akihiro
Published in Thin solid films (01.04.2009)
Published in Thin solid films (01.04.2009)
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Conference Proceeding
Journal Article
Preparation of n-type nanocrystalline 3C-SiC films by hot-wire CVD using N2 as doping gas
HOSHIDE, Yoshiki, TABATA, Akimori, KITAGAWA, Akihiko, KONDO, Akihiro
Published in Thin solid films (01.04.2009)
Published in Thin solid films (01.04.2009)
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Conference Proceeding
Journal Article
N2 decomposition by hot wire and N2 post-deposition treatment on hydrogenated microcrystalline silicon thin films
MAZAKI, Koji, TABATA, Akimori, KITAGAWA, Akihiko, KONDO, Akihiro
Published in Thin solid films (01.04.2009)
Published in Thin solid films (01.04.2009)
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Conference Proceeding
Journal Article
Enhancement of Crystal Growth in Si Thin-Film Deposition by H-Radical-Assisted Magnetron Sputtering
Fukaya, Kota, Tabata, Akimori, Sasaki, Koichi
Published in Japanese Journal of Applied Physics (01.01.2010)
Published in Japanese Journal of Applied Physics (01.01.2010)
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Journal Article
Structural changes in tungsten wire and their effect on the properties of hydrogenated nanocrystalline cubic silicon carbide thin films
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Conference Proceeding
Preparation of Wide-Gap Hydrogenated Amorphous Silicon Carbide Thin Films by Hot-Wire Chemical Vapor Deposition at a Low Tungsten Temperature
Tabata, Akimori, Nakajima, Takayuki, Mizutani, Teruyoshi, Suzuoki, Yasuo
Published in Japanese Journal of Applied Physics (15.01.2003)
Published in Japanese Journal of Applied Physics (15.01.2003)
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Journal Article
Effect of Plasma Off Time on the Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Pulse-Modulated Plasma Deposition
Tabata, Akimori, Sekito, Makoto, Mizutani, Teruyoshi, Suzuoki, Yasuo
Published in Japanese Journal of Applied Physics (2001)
Published in Japanese Journal of Applied Physics (2001)
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Journal Article
Structural changes of hot-wire CVD silicon carbide thin films induced by gas flow rates
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Conference Proceeding
Highly conductive nitrogen-doped hydrogenated nanocrystalline cubic silicon carbide thin films prepared with a hot-wire chemical vapor deposition from SiH4/CH4/H2/N2 gas
Tabata, Akimori, Hoshide, Yoshiki, Kondo, Akihiro
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15.12.2010)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15.12.2010)
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Journal Article
N2 post-deposition treatment on silicon thin films with a hot-wire chemical vapor method at a low wire temperature
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Conference Proceeding
Journal Article
Optical properties and structrue of SiO2 films prepared by ion-beam sputtering
Tabata, Akimori, Matsuno, Noriaki, Suzuoki, Yasuo, Mizutani, Teruyoshi
Published in Thin solid films (01.11.1996)
Published in Thin solid films (01.11.1996)
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Influence of hydrogen addition and gas pressure on nitride layer formation on microcrystalline silicon thin films by a hot-wire chemical vapor method using nitrogen gas
Tabata, Akimori, Mazaki, Koji, Kondo, Akihiro
Published in Surface & coatings technology (01.05.2010)
Published in Surface & coatings technology (01.05.2010)
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Journal Article
kW-value of a photovoltaic power generation system evaluated from actual data on electricity demand and insolation
Kato, Takeyoshi, Nagae, Nobuhisa, Tabata, Akimori, Yokomizu, Yasunobu, Okamoto, Tatsuki, Suzuoki, Yasuo
Published in Electrical engineering in Japan (15.07.2003)
Published in Electrical engineering in Japan (15.07.2003)
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