Influence of crystal-originated particle microstructure on silicon wafers on gate oxide integrity
MIYAZAKI, M, MIYAZAKI, S, KITAMURA, T, YANASE, Y, OCHIAI, T, TSUYA, H
Published in Japanese Journal of Applied Physics (01.10.1997)
Published in Japanese Journal of Applied Physics (01.10.1997)
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Formation of grown-in defects during Czochralski silicon crystal growth
NISHIKAWA, H, TANAKA, T, YANASE, Y, HOURAI, M, SANO, M, TSUYA, H
Published in Japanese Journal of Applied Physics (01.11.1997)
Published in Japanese Journal of Applied Physics (01.11.1997)
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Relationship between grown-in defects in Czochralski silicon crystals
UMENO, S, OKUI, M, HOURAI, M, SANO, M, TSUYA, H
Published in Japanese Journal of Applied Physics (01.05.1997)
Published in Japanese Journal of Applied Physics (01.05.1997)
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Gettering of Cu and Ni impurities in SIMOX wafers
JABLONSKI, J, MIYAMURA, Y, IMAI, M, TSUYA, H
Published in Journal of the Electrochemical Society (01.06.1995)
Published in Journal of the Electrochemical Society (01.06.1995)
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Atomic Force Microscope Observation of the Change in Shape and Subsequent Disappearance of “Crystal-Originated Particles” after Hydrogen-Atmosphere Thermal Annealing
Yanase, Yoshio, Nishihata, Hideki, Ochiai, Takashi, Tsuya, Hideki
Published in Japanese Journal of Applied Physics (01.01.1998)
Published in Japanese Journal of Applied Physics (01.01.1998)
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Behavior of defects in heavily boron doped Czochralski silicon
ONO, T, ASAYAMA, E, HORIE, H, HOURAI, M, SANO, M, TSUYA, H, NAKAI, K
Published in Japanese Journal of Applied Physics (01.03.1997)
Published in Japanese Journal of Applied Physics (01.03.1997)
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Surface- and inner-microdefects in annealed silicon wafer containing oxygen
Shimura, Fumio, Tsuya, Hideki, Kawamura, Tsutomu
Published in Journal of applied physics (01.01.1980)
Published in Journal of applied physics (01.01.1980)
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Thermally Induced Defect Behavior and Effective Intrinsic Gettering Sink in Silicon Wafers
Shimura, Fumio, Tsuya, Hideki, Kawamura, Tsutomu
Published in Journal of the Electrochemical Society (01.07.1981)
Published in Journal of the Electrochemical Society (01.07.1981)
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