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Year of Publication 31.07.2008
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Year of Publication 21.12.2006
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Year of Publication 03.04.2008
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Year of Publication 28.02.2008
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Method of manufacturing semiconductor device having trench isolation
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Year of Publication 05.12.2006
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Method of manufacturing semiconductor device having trench isolation
TSUJIUCHI MIKIO, MAEGAWA SHIGETO, MATSUMOTO TAKUJI, MAEDA SHIGENOBU, IWAMATSU TOSHIAKI, HIRANO YUUICHI
Year of Publication 05.12.2006
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Year of Publication 05.12.2006
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Method of manufacturing semiconductor device having trench isolation
TSUJIUCHI MIKIO, MAEGAWA SHIGETO, MATSUMOTO TAKUJI, MAEDA SHIGENOBU, IWAMATSU TOSHIAKI, HIRANO YUUICHI
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Year of Publication 09.11.2006
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SEMICONDUCTOR DEVICE
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Year of Publication 23.03.2006
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Year of Publication 23.03.2006
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Method of manufacturing semiconductor device having trench isolation
TSUJIUCHI MIKIO, MAEGAWA SHIGETO, MATSUMOTO TAKUJI, MAEDA SHIGENOBU, IWAMATSU TOSHIAKI, HIRANO YUUICHI
Year of Publication 17.02.2005
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Year of Publication 17.02.2005
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Method of manufacturing semiconductor device having trench isolation
Matsumoto, Takuji, Tsujiuchi, Mikio, Iwamatsu, Toshiaki, Maeda, Shigenobu, Hirano, Yuuichi, Maegawa, Shigeto
Year of Publication 11.01.2005
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Year of Publication 11.01.2005
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Method of manufacturing semiconductor device having trench isolation
TSUJIUCHI MIKIO, MAEGAWA SHIGETO, MATSUMOTO TAKUJI, MAEDA SHIGENOBU, IWAMATSU TOSHIAKI, HIRANO YUUICHI
Year of Publication 11.01.2005
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Year of Publication 11.01.2005
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Body bias controlled SOI technology with HTI
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Published in International Meeting for Future of Electron Devices, 2004 (2004)
Published in International Meeting for Future of Electron Devices, 2004 (2004)
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Conference Proceeding
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR WAFER
TSUJIUCHI MIKIO, MATSUMOTO TAKUJI, MAEDA SHIGENOBU, IWAMATSU TOSHIAKI, HIRANO YUICHI, MAEKAWA SHIGETO
Year of Publication 29.08.2003
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Year of Publication 29.08.2003
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Method of manufacturing semicontor device having trench isolation
TSUJIUCHI MIKIO, MAEGAWA SHIGETO, MATSUMOTO TAKUJI, MAEDA SHIGENOBU, IWAMATSU TOSHIAKI, HIRANO YUUICHI
Year of Publication 14.08.2003
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Year of Publication 14.08.2003
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Method of manufacturing semicontor device having trench isolation
Tsujiuchi, Mikio, Matsumoto, Takuji, Iwamatsu, Toshiaki, Maeda, Shigenobu, Hirano, Yuuichi, Maegawa, Shigeto
Year of Publication 14.08.2003
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Year of Publication 14.08.2003
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DISPOSITIF A SEMICONDUCTEUR, PROCEDE DE FABRICATION ET TRANCHE DE SEMICONDUCTEUR
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Year of Publication 15.08.2003
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Year of Publication 15.08.2003
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