Elektrostatische Haltevorrichtung benutzbar in Hochdichteplasma
MARKS, JEFFREY, TROW, JOHN R, COLLINS, KENNETH S, RODERICK, CRAIG A, TSUI, JOSHUA CHIU-WING, BRIGHT, NICOLAS J, DING, JIAN, ISHIKAWA, TETSUYA
Year of Publication 02.12.1999
Get full text
Year of Publication 02.12.1999
Patent
Electrostatic chuck usable in high density plasma
MARKS, JEFFREY, TROW, JOHN R, COLLINS, KENNETH S, RODERICK, CRAIG A, TSUI, JOSHUA CHIU-WING, BRIGHT, NICOLAS J, DING, JIAN, ISHIKAWA, TETSUYA
Year of Publication 14.07.1999
Get full text
Year of Publication 14.07.1999
Patent
Electrostatic chuck usable in high density plasma
RODERICK; CRAIG A, ISHIKAWA; TETSUYA, COLLINS; KENNETH S, TROW; JOHN R, MARKS; JEFFREY, DING; JIAN, BRIGHT; NICOLAS J, TSUI; JOSHUA CHIU-WING
Year of Publication 10.12.1996
Get full text
Year of Publication 10.12.1996
Patent