Anomalous Gate-Edge Leakage Induced by High Tensile Stress in NMOSFET
LIU, Po-Tsun, HUANG, Chen-Shuo, LIM, Peng-Soon, LEE, Da-Yuan, TSAO, Shueh-Wen, CHEN, Chi-Chun, TAO, Hun-Jan, MII, Yuh-Jier
Published in IEEE electron device letters (01.11.2008)
Published in IEEE electron device letters (01.11.2008)
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