The effect of fluorine on MOSFET channel length
Lin, D.-G., Rost, T.A., Lee, H.S., Lin, D.-Y., Tsao, A.J., McKee, B.
Published in IEEE electron device letters (01.10.1993)
Published in IEEE electron device letters (01.10.1993)
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Journal Article
Wiring layer fill structures
TSAO, ALWIN, J, STRONG, BOBBY, D, RUSSELL, NOEL, BORST, CHRISTOPHER L
Year of Publication 22.07.2009
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Year of Publication 22.07.2009
Patent